Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for non-destructive distribution profiling of an element in a film

Method and system for non-destructive distribution profiling of an element in a film

US Patent 7884321 · Granted Feb 8, 2011

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for measuring a sample by x-ray reflectance scatterometry2025
System and method for measuring a sample by x-ray reflectance scatterometry2025
Systems and approaches for semiconductor metrology and surface analysis using se2024
Systems and approaches for semiconductor metrology and surface analysis using se2024
Patterned x-ray emitting target2024
Patterned x-ray emitting target2024
System and method for measuring a sample by x-ray reflectance scatterometry2024
Mass spectrometer detector and system and method using the same2023
Systems and approaches for semiconductor metrology and surface analysis using se2023
Systems and approaches for semiconductor metrology and surface analysis using se2023
Systems and approaches for semiconductor metrology and surface analysis using Se2022
Systems and approaches for semiconductor metrology and surface analysis using Se2022