Issued Patents All Time
Showing 51–75 of 84 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10553532 | Structure and method to self align via to top and bottom of tight pitch metal interconnect layers | Richard E. Schenker, Robert L. Bristol, Mauro J. Kobrinsky, Kevin Lin | 2020-02-04 |
| 10546772 | Self-aligned via below subtractively patterned interconnect | Richard E. Schenker, Hui Jae Yoo, Kevin Lin, Jasmeet S. Chawla, Stephanie A. Bojarski +3 more | 2020-01-28 |
| 10535601 | Via blocking layer | Rami Hourani, Marie Krysak, Florian Gstrein, Ruth A. Brain, Mark Bohr | 2020-01-14 |
| 10483160 | Ultra thin helmet dielectric layer for maskless air gap and replacement ILD processes | Jeffery D. Bielefeld, Asad Iqbal, John D. Brooks | 2019-11-19 |
| 10256141 | Maskless air gap to prevent via punch through | Todd R. Younkin, Eungnak Han, Jasmeet S. Chawla, Marie Krysak, Hui Jae Yoo +1 more | 2019-04-09 |
| 10109583 | Method for creating alternate hardmask cap interconnect structure with increased overlay margin | Robert L. Bristol, Jasmeet S. Chawla, Florian Gstrein, Eungnak Han, Rami Hourani +3 more | 2018-10-23 |
| 9385085 | Interconnects with fully clad lines | Hui Jae Yoo, Christopher J. Jezewski, Ramanan V. Chebiam, Colin T. Carver | 2016-07-05 |
| 9324652 | Method of creating a maskless air gap in back end interconnections with double self-aligned vias | Hui Jae Yoo, Yan Borodovsky, Florian Gstrein, David Shykind, Kevin Lin | 2016-04-26 |
| 9165824 | Interconnects with fully clad lines | Hui Jae Yoo, Christopher J. Jezewski, Ramanan V. Chebiam, Colin T. Carver | 2015-10-20 |
| 8975138 | Method of creating a maskless air gap in back end interconnects with double self-aligned vias | Hui Jae Yoo, Yan Borodovsky, Florian Gstrein, David Shykind, Kevin Lin | 2015-03-10 |
| 7691544 | Measurement of a scattered light point spread function (PSF) for microelectronic photolithography | Allen B. Gardiner, Seongtae Jeong, Marie T. Conte, Chris Kenyon | 2010-04-06 |
| 7615337 | Photoactive resist capping layer | Robert Meagley, Michael L. McSwiney, Michael Goodner, Robert Leet | 2009-11-10 |
| 7527920 | Active hardmask for lithographic patterning | Michael Goldstein, Eric Panning, Robert L. Bristol, Bryan Rice | 2009-05-05 |
| 7459260 | Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method | Wang Yueh, Heidi Cao | 2008-12-02 |
| 7449264 | Compensation of reflective mask effects in lithography systems | Michael Goldstein | 2008-11-11 |
| 7446873 | Reflective alignment grating | — | 2008-11-04 |
| 7442487 | Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists | Wang Yueh, Heidi Cao | 2008-10-28 |
| 7374867 | Enhancing photoresist performance using electric fields | Robert L. Bristol, Heidi Cao, Robert Meagley, Vijayakumar Ramachandrarao | 2008-05-20 |
| 7208747 | Adjustment of distance between source plasma and mirrors to change partial coherence | Eric Panning, Bryan Rice | 2007-04-24 |
| 7135419 | Line edge roughness reduction | Robert Meagley | 2006-11-14 |
| 7109504 | Extreme ultraviolet illumination source | Eric Panning, Bryan Rice | 2006-09-19 |
| 7098466 | Adjustable illumination source | Eric Panning, Bryan Rice | 2006-08-29 |
| 7078700 | Optics for extreme ultraviolet lithography | Bryan Rice, Robert L. Bristol | 2006-07-18 |
| 7041993 | Protective coatings for radiation source components | Kramadhati V. Ravi, Robert L. Bristol, Melissa Shell | 2006-05-09 |
| 7033734 | Dipole illumination | — | 2006-04-25 |