| 10747115 |
Cross scan proximity correction with ebeam universal cutter |
— |
2020-08-18 |
$29,577,000 |
| 10578970 |
Ebeam universal cutter |
Donald W. Nelson, Mark C. Phillips |
2020-03-03 |
$18,388,000 |
| 10386722 |
Ebeam staggered beam aperture array |
Donald W. Nelson, Mark C. Phillips |
2019-08-20 |
$17,708,000 |
| 10338474 |
Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography |
Shakul Tandon, Charles H. Wallace, Paul A. Nyhus |
2019-07-02 |
$19,690,000 |
| 10290528 |
Ebeam align on the fly |
Donald W. Nelson, Mark C. Phillips |
2019-05-14 |
$24,469,000 |
| 10236161 |
Fine alignment system for electron beam exposure system |
— |
2019-03-19 |
$29,538,000 |
| 10216087 |
Ebeam universal cutter |
Donald W. Nelson, Mark C. Phillips |
2019-02-26 |
$20,644,000 |
| 10191376 |
Cross scan proximity correction with ebeam universal cutter |
— |
2019-01-29 |
$23,219,000 |
| 10067416 |
Ebeam three beam aperture array |
Donald W. Nelson, Mark C. Phillips |
2018-09-04 |
$19,235,000 |
| 10014256 |
Unidirectional metal on layer with ebeam |
Donald W. Nelson, Mark C. Phillips |
2018-07-03 |
$24,450,000 |
| 9952511 |
Ebeam non-universal cutter |
Donald W. Nelson, Mark C. Phillips |
2018-04-24 |
$19,097,000 |
| 9899182 |
Corner rounding correction for electron beam (Ebeam) direct write system |
— |
2018-02-20 |
$17,556,000 |
| 9897908 |
Ebeam three beam aperture array |
Donald W. Nelson, Mark C. Phillips |
2018-02-20 |
$17,556,000 |
| 9324652 |
Method of creating a maskless air gap in back end interconnections with double self-aligned vias |
Manish Chandhok, Hui Jae Yoo, Florian Gstrein, David Shykind, Kevin Lin |
2016-04-26 |
$9,347,000 |
| 8975138 |
Method of creating a maskless air gap in back end interconnects with double self-aligned vias |
Manish Chandhok, Hui Jae Yoo, Florian Gstrein, David Shykind, Kevin Lin |
2015-03-10 |
$28,858,000 |
| 8122388 |
Phase-shifting masks with sub-wavelength diffractive optical elements |
Bin Hu, Vivek Singh |
2012-02-21 |
$21,312,000 |
| 8112726 |
Phase-shifting masks with sub-wavelength diffractive optical elements |
Bin Hu, Vivek Singh |
2012-02-07 |
$29,971,000 |
| 7892706 |
Sub-wavelength diffractive elements to reduce corner rounding |
Bikram Baidya, Vivek Singh |
2011-02-22 |
$16,036,000 |
| 7732106 |
Methods for etching devices used in lithography |
Edita Tejnil |
2010-06-08 |
$11,764,000 |
| 7611806 |
Sub-wavelength diffractive elements to reduce corner rounding |
Bikram Baidya, Vivek Singh |
2009-11-03 |
$21,230,000 |
| 7512926 |
Phase-shifting masks with sub-wavelength diffractive optical elements |
Bin Hu, Vivek Singh |
2009-03-31 |
$17,039,000 |
| 7438997 |
Imaging and devices in lithography |
Edita Tejnil |
2008-10-21 |
$17,085,000 |
| 7254803 |
Test structures for feature fidelity improvement |
Seongtae Jeong |
2007-08-07 |
$27,562,000 |
| 7245352 |
Alignment using latent images |
Ilya Grodnensky |
2007-07-17 |
$13,694,000 |
| 7142282 |
Device including contacts |
— |
2006-11-28 |
$16,743,000 |
