Issued Patents All Time
Showing 25 most recent of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10747115 | Cross scan proximity correction with ebeam universal cutter | — | 2020-08-18 |
| 10578970 | Ebeam universal cutter | Donald W. Nelson, Mark C. Phillips | 2020-03-03 |
| 10386722 | Ebeam staggered beam aperture array | Donald W. Nelson, Mark C. Phillips | 2019-08-20 |
| 10338474 | Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography | Shakul Tandon, Charles H. Wallace, Paul A. Nyhus | 2019-07-02 |
| 10290528 | Ebeam align on the fly | Donald W. Nelson, Mark C. Phillips | 2019-05-14 |
| 10236161 | Fine alignment system for electron beam exposure system | — | 2019-03-19 |
| 10216087 | Ebeam universal cutter | Donald W. Nelson, Mark C. Phillips | 2019-02-26 |
| 10191376 | Cross scan proximity correction with ebeam universal cutter | — | 2019-01-29 |
| 10067416 | Ebeam three beam aperture array | Donald W. Nelson, Mark C. Phillips | 2018-09-04 |
| 10014256 | Unidirectional metal on layer with ebeam | Donald W. Nelson, Mark C. Phillips | 2018-07-03 |
| 9952511 | Ebeam non-universal cutter | Donald W. Nelson, Mark C. Phillips | 2018-04-24 |
| 9899182 | Corner rounding correction for electron beam (Ebeam) direct write system | — | 2018-02-20 |
| 9897908 | Ebeam three beam aperture array | Donald W. Nelson, Mark C. Phillips | 2018-02-20 |
| 9324652 | Method of creating a maskless air gap in back end interconnections with double self-aligned vias | Manish Chandhok, Hui Jae Yoo, Florian Gstrein, David Shykind, Kevin Lin | 2016-04-26 |
| 8975138 | Method of creating a maskless air gap in back end interconnects with double self-aligned vias | Manish Chandhok, Hui Jae Yoo, Florian Gstrein, David Shykind, Kevin Lin | 2015-03-10 |
| 8122388 | Phase-shifting masks with sub-wavelength diffractive optical elements | Bin Hu, Vivek Singh | 2012-02-21 |
| 8112726 | Phase-shifting masks with sub-wavelength diffractive optical elements | Bin Hu, Vivek Singh | 2012-02-07 |
| 7892706 | Sub-wavelength diffractive elements to reduce corner rounding | Bikram Baidya, Vivek Singh | 2011-02-22 |
| 7732106 | Methods for etching devices used in lithography | Edita Tejnil | 2010-06-08 |
| 7611806 | Sub-wavelength diffractive elements to reduce corner rounding | Bikram Baidya, Vivek Singh | 2009-11-03 |
| 7512926 | Phase-shifting masks with sub-wavelength diffractive optical elements | Bin Hu, Vivek Singh | 2009-03-31 |
| 7438997 | Imaging and devices in lithography | Edita Tejnil | 2008-10-21 |
| 7254803 | Test structures for feature fidelity improvement | Seongtae Jeong | 2007-08-07 |
| 7245352 | Alignment using latent images | Ilya Grodnensky | 2007-07-17 |
| 7142282 | Device including contacts | — | 2006-11-28 |