Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9798226 | Pattern optical similarity determination | — | 2017-10-24 |
| 9459523 | Pattern optical similarity determination | — | 2016-10-04 |
| 8792147 | Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layout | — | 2014-07-29 |
| 8521481 | Method, program product and apparatus for modeling resist development of a lithography process | — | 2013-08-27 |
| 7732106 | Methods for etching devices used in lithography | Yan Borodovsky | 2010-06-08 |
| 7438997 | Imaging and devices in lithography | Yan Borodovsky | 2008-10-21 |
| 7433791 | Method of performing multiple stage model calibration for optical imaging simulation models | Sangbong Park, Duan-Fu Stephen Hsu | 2008-10-07 |
| 7326501 | Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM) | — | 2008-02-05 |
| 7033708 | Image focus monitor for alternating phase shift masks | — | 2006-04-25 |
| 6972419 | Extreme ultraviolet radiation imaging | — | 2005-12-06 |
| 6800406 | Method of generating optical assist features for two-mask exposure lithography | — | 2004-10-05 |
| 6774990 | Method to inspect patterns with high resolution photoemission | Ted Liang, Alan Stivers | 2004-08-10 |
| 6632576 | Optical assist feature for two-mask exposure lithography | — | 2003-10-14 |
| 6625800 | Method and apparatus for physical image based inspection system | Qi-De Qian, Giang T. Dao | 2003-09-23 |
| 6506526 | Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength | Alan Stivers | 2003-01-14 |
| 6410193 | Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength | Alan Stivers | 2002-06-25 |
| 6195169 | Phase-shifting point diffraction interferometer grating designs | Patrick P. Naulleau, Kenneth Alan Goldberg | 2001-02-27 |