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Pattern optical similarity determination |
— |
2017-10-24 |
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Pattern optical similarity determination |
— |
2016-10-04 |
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Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layout |
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2014-07-29 |
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Method, program product and apparatus for modeling resist development of a lithography process |
— |
2013-08-27 |
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Methods for etching devices used in lithography |
Yan Borodovsky |
2010-06-08 |
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Imaging and devices in lithography |
Yan Borodovsky |
2008-10-21 |
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Method of performing multiple stage model calibration for optical imaging simulation models |
Sangbong Park, Duan-Fu Stephen Hsu |
2008-10-07 |
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Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM) |
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2008-02-05 |
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Image focus monitor for alternating phase shift masks |
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2006-04-25 |
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Extreme ultraviolet radiation imaging |
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2005-12-06 |
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Method of generating optical assist features for two-mask exposure lithography |
— |
2004-10-05 |
| 6774990 |
Method to inspect patterns with high resolution photoemission |
Ted Liang, Alan Stivers |
2004-08-10 |
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Optical assist feature for two-mask exposure lithography |
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2003-10-14 |
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Method and apparatus for physical image based inspection system |
Qi-De Qian, Giang T. Dao |
2003-09-23 |
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Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength |
Alan Stivers |
2003-01-14 |
| 6410193 |
Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength |
Alan Stivers |
2002-06-25 |
| 6195169 |
Phase-shifting point diffraction interferometer grating designs |
Patrick P. Naulleau, Kenneth Alan Goldberg |
2001-02-27 |
