Edita Tejnil — 17 Patents at Intel

Edita Tejnil has been granted 17 US patents while listed as an inventor at Intel. The first was granted in 2001 and the most recent in October 2017. Edita Tejnil ranks #263,971 of 4,157,543 US inventors in our database (top 6.3%). Patent records list Edita Tejnil in Cupertino, CA, US.

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
9798226	Pattern optical similarity determination	—	2017-10-24
9459523	Pattern optical similarity determination	—	2016-10-04	$14,278,000
8792147	Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layout	—	2014-07-29	$9,035,000
8521481	Method, program product and apparatus for modeling resist development of a lithography process	—	2013-08-27
7732106	Methods for etching devices used in lithography	Yan Borodovsky	2010-06-08	$11,764,000
7438997	Imaging and devices in lithography	Yan Borodovsky	2008-10-21	$17,085,000
7433791	Method of performing multiple stage model calibration for optical imaging simulation models	Sangbong Park, Duan-Fu Stephen Hsu	2008-10-07
7326501	Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM)	—	2008-02-05	$13,136,000
7033708	Image focus monitor for alternating phase shift masks	—	2006-04-25	$12,896,000
6972419	Extreme ultraviolet radiation imaging	—	2005-12-06	$17,814,000
6800406	Method of generating optical assist features for two-mask exposure lithography	—	2004-10-05	$22,015,000
6774990	Method to inspect patterns with high resolution photoemission	Ted Liang, Alan Stivers	2004-08-10	$15,945,000
6632576	Optical assist feature for two-mask exposure lithography	—	2003-10-14	$51,971,000
6625800	Method and apparatus for physical image based inspection system	Qi-De Qian, Giang T. Dao	2003-09-23	$27,638,000
6506526	Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength	Alan Stivers	2003-01-14	$60,878,000
6410193	Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength	Alan Stivers	2002-06-25	$55,737,000
6195169	Phase-shifting point diffraction interferometer grating designs	Patrick P. Naulleau, Kenneth Alan Goldberg	2001-02-27

Edita Tejnil — 17 Patents

Issued Patents All Time

Patent Widget