IG

Ilya Grodnensky

NP Nikon Precision: 8 patents #1 of 34Top 3%
KL Kla-Tencor: 3 patents #442 of 1,394Top 35%
NI Nikon: 2 patents #1,269 of 2,493Top 55%
IN Intel: 1 patents #18,218 of 30,777Top 60%
📍 Foster City, CA: #268 of 2,058 inventorsTop 15%
🗺 California: #40,325 of 386,348 inventorsTop 15%
Overall (All Time): #322,809 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
9499673 Method and apparatus for producing a nanocomposite material reinforced by unidirectionally oriented pre-dispersed alumina nanofibers 2016-11-22
9303137 Nanocomposite material containing alumina nanofibers and method for making same 2016-04-05
8809436 Apparatus and method for producing coatings reinforced with alumina nanofibers 2014-08-19
8049903 High resolution monitoring of CD variations Jon Opsal, Heath A. Pois 2011-11-01
7933026 High resolution monitoring of CD variations Jon Opsal, Heath A. Pois 2011-04-26
7567351 High resolution monitoring of CD variations Jon Opsal, Heath A. Pois 2009-07-28
7245352 Alignment using latent images Yan Borodovsky 2007-07-17
6956659 Measurement of critical dimensions of etched features 2005-10-18
6750952 Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing Kyoichi Suwa, Kazuo Ushida, Eric R. Johnson 2004-06-15
6664121 Method and apparatus for position measurement of a pattern formed by a lithographic exposure tool Steve Slonaker 2003-12-16
6538753 Method and apparatus for dimension measurement of a pattern formed by lithographic exposure tools Eric R. Johnson, Steve Slonaker 2003-03-25
6449031 Method for use of a critical dimensional test structure Kyoichi Suwa, Kazuo Ushida, Eric R. Johnson 2002-09-10
6323938 Method of characterizing photolithographic tool performance and photolithographic tool thereof Toshihiro Sasaya 2001-11-27
6094256 Method for forming a critical dimension test structure and its use Kyoichi Suwa, Kazuo Ushida, Eric R. Johnson 2000-07-25
5835227 Method and apparatus for determining performance characteristics in lithographic tools Etsuya Morita, Kyoichi Suwa, Shigeru Hirukawa 1998-11-10