Issued Patents All Time
Showing 1–25 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10088760 | Exposure apparatus, exposure method, method for producing device, and optical part | Hiroyuki Nagasaka, Hiroaki Takaiwa, Ryuichi Hoshika, Hitoshi Ishizawa | 2018-10-02 |
| 10082739 | Exposure method, exposure apparatus, and method for producing device | — | 2018-09-25 |
| 10048602 | Exposure apparatus, exposure method, and method for producing device | Naoyuki Kobayashi, Soichi Owa, Yasuhiro Omura | 2018-08-14 |
| 9885959 | Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator | Takehito Kudo | 2018-02-06 |
| 9846371 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method | Soichi Owa, Nobutaka Magome, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno +6 more | 2017-12-19 |
| 9678437 | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction | Takehito Kudo | 2017-06-13 |
| 9488920 | Exposure method, exposure apparatus, and method for producing device | — | 2016-11-08 |
| 9316921 | Exposure apparatus, exposure method, and method for producing device | Naoyuki Kobayashi, Soichi Owa, Yasuhiro Omura | 2016-04-19 |
| 9268237 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method | Soichi Owa, Nobutaka Magome, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno +6 more | 2016-02-23 |
| 9182685 | Exposure apparatus, exposure method, method for producing device, and optical part | Hiroyuki Nagasaka, Hiroaki Takaiwa, Ryuichi Hoshika, Hitoshi Ishizawa | 2015-11-10 |
| 9164393 | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas | Takehito Kudo | 2015-10-20 |
| 9146474 | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas | Takehito Kudo | 2015-09-29 |
| 9019467 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method | Soichi Owa, Nobutaka Magome, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno +6 more | 2015-04-28 |
| 9019469 | Exposure apparatus, exposure method, method for producing device, and optical part | Hiroyuki Nagasaka, Hiroaki Takaiwa, Ryuichi Hoshika, Hitoshi Ishizawa | 2015-04-28 |
| 8810767 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device | Hiroyuki Nagasaka, Kenichi Shiraishi, Soichi Owa | 2014-08-19 |
| 8711324 | Exposure method, exposure apparatus, and method for producing device | — | 2014-04-29 |
| 8698998 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device | Hiroyuki Nagasaka, Kenichi Shiraishi, Soichi Owa | 2014-04-15 |
| 8675177 | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas | Takehito Kudo | 2014-03-18 |
| 8605252 | Exposure apparatus, exposure method, and method for producing device | Naoyuki Kobayashi, Soichi Owa, Yasuhiro Omura | 2013-12-10 |
| 8435723 | Pattern forming method and device production method | Yuichi Shibazaki | 2013-05-07 |
| 8421992 | Exposure method, exposure apparatus, and method for producing device | — | 2013-04-16 |
| 8405816 | Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method | Soichi Owa | 2013-03-26 |
| 8384880 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method | Soichi Owa, Nobutaka Magome, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno +6 more | 2013-02-26 |
| 8343693 | Focus test mask, focus measurement method, exposure method and exposure apparatus | Shinjiro Kondo | 2013-01-01 |
| 8294876 | Exposure apparatus and device manufacturing method | — | 2012-10-23 |