Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6265137 | Exposure method and device producing method using the same | — | 2001-07-24 |
| 6249335 | Photo-mask and method of exposing and projection-exposing apparatus | Naomasa Shiraishi, Masaomi Kameyama | 2001-06-19 |
| 6132908 | Photo mask and exposure method using the same | Naomasa Shiraishi, Nobutaka Magome | 2000-10-17 |
| 6118516 | Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns | Nobuyuki Irie, Nobutaka Magome, Yasuaki Tanaka, Naomasa Shiraishi | 2000-09-12 |
| 5835227 | Method and apparatus for determining performance characteristics in lithographic tools | Ilya Grodnensky, Etsuya Morita, Kyoichi Suwa | 1998-11-10 |
| 5808910 | Alignment method | Nobuyuki Irie | 1998-09-15 |
| 5703675 | Projection-exposing apparatus with deflecting grating member | Naomasa Shiraishi, Masaomi Kameyama | 1997-12-30 |
| 5615006 | Imaging characteristic and asymetric abrerration measurement of projection optical system | Shinjiro Kondo, Takeshi Kato, Kyoichi Suwa | 1997-03-25 |
| 5596204 | Method for aligning processing areas on a substrate with a predetermined position in a static coordinate system | Nobuyuki Irie, Hiroki Tateno | 1997-01-21 |
| 5552856 | Projection exposure apparatus | Naomasa Shiraishi | 1996-09-03 |
| 5525808 | Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions | Nobuyuki Irie, Eiji Takane, Yoshichika Iwamoto, Ryoichi Kaneko | 1996-06-11 |
| 5493402 | EGA alignment method using a plurality of weighting coefficients | — | 1996-02-20 |
| 5475490 | Method of measuring a leveling plane | Eiji Takane | 1995-12-12 |
| 5434026 | Exposure condition measurement method | Norihiko Takatsu, Kyoichi Suwa, Shinichi Nakamura, Hiroaki Hosokawa | 1995-07-18 |
| 5408083 | Method of measuring the best focus position having a plurality of measuring mark images and a plurality of focus positions | Eiji Takane | 1995-04-18 |
| 5402224 | Distortion inspecting method for projection optical system | Nobutaka Magome, Kyoichi Suwa | 1995-03-28 |
| 4931830 | Projection exposure apparatus | Kyoichi Suwa, Kazuo Ushida, Takeshi Suto, Masaomi Kameyama, Shinichi Nakamura | 1990-06-05 |
| 4908656 | Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision | Kyoichi Suwa, Hiroki Tateno | 1990-03-13 |