Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE39662 | Projection exposure apparatus | Masaomi Kameyama, Takashi Mori | 2007-05-29 |
| 6958803 | Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics | Toshihiro Sasaya, Kazumasa Endo | 2005-10-25 |
| 6750952 | Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing | Ilya Grodnensky, Kyoichi Suwa, Eric R. Johnson | 2004-06-15 |
| RE38403 | Projection optical system and projection exposure apparatus | Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado | 2004-01-27 |
| RE38320 | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system | Kenji Nishi, Seiro Murakami, Tohru Kiuchi, Yasuaki Tanaka | 2003-11-18 |
| 6610460 | Exposure method | Masaya Komatsu, Kyoichi Suwa | 2003-08-26 |
| 6449031 | Method for use of a critical dimensional test structure | Ilya Grodnensky, Kyoichi Suwa, Eric R. Johnson | 2002-09-10 |
| 6262793 | Method of manufacturing and using correction member to correct aberration in projection exposure apparatus | Toshihiro Sasaya, Kazumasa Endo | 2001-07-17 |
| 6094256 | Method for forming a critical dimension test structure and its use | Ilya Grodnensky, Kyoichi Suwa, Eric R. Johnson | 2000-07-25 |
| 6049374 | Illumination apparatus, a projection exposure apparatus having the same, a method of manufacturing a device using the same, and a method of manufacturing the projection exposure apparatus | Hideki Komatsuda | 2000-04-11 |
| 5943172 | Projection optical system and projection exposure apparatus | Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado | 1999-08-24 |
| 5883704 | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system | Kenji Nishi, Seiro Murakami, Tohru Kiuchi, Yasuaki Tanaka | 1999-03-16 |
| 5831776 | Projection optical system and projection exposure apparatus | Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado | 1998-11-03 |
| 5805344 | Projection optical system and projection exposure apparatus | Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado | 1998-09-08 |
| 5754340 | Projection optical system and projection exposure apparatus using the same | Koichi Matsumoto | 1998-05-19 |
| 5636000 | Projection optical system and projection exposure apparatus using the same | Sumio Hashimoto | 1997-06-03 |
| 5576801 | Projection exposure apparatus | Masaomi Kameyama | 1996-11-19 |
| 5530518 | Projection exposure apparatus | Masaomi Kameyama | 1996-06-25 |
| 5311362 | Projection exposure apparatus | Koichi Matsumoto, Masaomi Kameyama, Hiroyuki Tsuchiya | 1994-05-10 |
| 4965630 | Projection exposure apparatus | Kinya Kato, Toshiyuki Namikawa, Koichi Matsumoto, Kyoichi Suwa, Koichi Ohno | 1990-10-23 |
| 4931830 | Projection exposure apparatus | Kyoichi Suwa, Takeshi Suto, Masaomi Kameyama, Shigeru Hirukawa, Shinichi Nakamura | 1990-06-05 |
| 4734746 | Exposure method and system for photolithography | Satoru Anzai, Kazuaki Suzuki, Toshio Matsuura, Kyoichi Suwa, Koichi Matsumoto | 1988-03-29 |
| 4592624 | Objective lens for microscope of low magnification | Masashi Tanaka, Yoshiyuki Shimizu | 1986-06-03 |
| 4403835 | Objective lens for microscope | — | 1983-09-13 |