| RE39662 |
Projection exposure apparatus |
Masaomi Kameyama, Takashi Mori |
2007-05-29 |
| 6958803 |
Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics |
Toshihiro Sasaya, Kazumasa Endo |
2005-10-25 |
| 6750952 |
Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing |
Ilya Grodnensky, Kyoichi Suwa, Eric R. Johnson |
2004-06-15 |
| RE38403 |
Projection optical system and projection exposure apparatus |
Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado |
2004-01-27 |
| RE38320 |
Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
Kenji Nishi, Seiro Murakami, Tohru Kiuchi, Yasuaki Tanaka |
2003-11-18 |
| 6610460 |
Exposure method |
Masaya Komatsu, Kyoichi Suwa |
2003-08-26 |
| 6449031 |
Method for use of a critical dimensional test structure |
Ilya Grodnensky, Kyoichi Suwa, Eric R. Johnson |
2002-09-10 |
| 6262793 |
Method of manufacturing and using correction member to correct aberration in projection exposure apparatus |
Toshihiro Sasaya, Kazumasa Endo |
2001-07-17 |
| 6094256 |
Method for forming a critical dimension test structure and its use |
Ilya Grodnensky, Kyoichi Suwa, Eric R. Johnson |
2000-07-25 |
| 6049374 |
Illumination apparatus, a projection exposure apparatus having the same, a method of manufacturing a device using the same, and a method of manufacturing the projection exposure apparatus |
Hideki Komatsuda |
2000-04-11 |
| 5943172 |
Projection optical system and projection exposure apparatus |
Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado |
1999-08-24 |
| 5883704 |
Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
Kenji Nishi, Seiro Murakami, Tohru Kiuchi, Yasuaki Tanaka |
1999-03-16 |
| 5831776 |
Projection optical system and projection exposure apparatus |
Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado |
1998-11-03 |
| 5805344 |
Projection optical system and projection exposure apparatus |
Toshihiro Sasaya, Yutaka Suenaga, Romeo I. Mercado |
1998-09-08 |
| 5754340 |
Projection optical system and projection exposure apparatus using the same |
Koichi Matsumoto |
1998-05-19 |
| 5636000 |
Projection optical system and projection exposure apparatus using the same |
Sumio Hashimoto |
1997-06-03 |
| 5576801 |
Projection exposure apparatus |
Masaomi Kameyama |
1996-11-19 |
| 5530518 |
Projection exposure apparatus |
Masaomi Kameyama |
1996-06-25 |
| 5311362 |
Projection exposure apparatus |
Koichi Matsumoto, Masaomi Kameyama, Hiroyuki Tsuchiya |
1994-05-10 |
| 4965630 |
Projection exposure apparatus |
Kinya Kato, Toshiyuki Namikawa, Koichi Matsumoto, Kyoichi Suwa, Koichi Ohno |
1990-10-23 |
| 4931830 |
Projection exposure apparatus |
Kyoichi Suwa, Takeshi Suto, Masaomi Kameyama, Shigeru Hirukawa, Shinichi Nakamura |
1990-06-05 |
| 4734746 |
Exposure method and system for photolithography |
Satoru Anzai, Kazuaki Suzuki, Toshio Matsuura, Kyoichi Suwa, Koichi Matsumoto |
1988-03-29 |
| 4592624 |
Objective lens for microscope of low magnification |
Masashi Tanaka, Yoshiyuki Shimizu |
1986-06-03 |
| 4403835 |
Objective lens for microscope |
— |
1983-09-13 |