MK

Masaya Komatsu

NI Nikon: 5 patents #754 of 2,493Top 35%
AB Asml Netherlands B.V.: 1 patents #2,025 of 3,192Top 65%
Overall (All Time): #808,363 of 4,157,543Top 20%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
11662666 Sub-field control of a lithographic process and associated apparatus Rowin MEIJERINK, Putra SAPUTRA, Pieter Gerardus Jacobus SMORENBERG, Theo Wilhelmus Maria THIJSSEN, Khalid ELBATTAY +3 more 2023-05-30
6610460 Exposure method Kyoichi Suwa, Kazuo Ushida 2003-08-26
5739898 Exposure method and apparatus Toshihiko Ozawa, Masato Shibuya, Hiroshi Ooki, Masaomi Kameyama, Yoshifumi Tokoyoda 1998-04-14
5682226 Photomask, an exposure method and a projection exposure apparatus Satoru Anzai 1997-10-28
5592259 Photomask, an exposure method and a projection exposure apparatus Satoru Anzai 1997-01-07
5508132 Photo mask 1996-04-16