HT

Hiroaki Takaiwa

NI Nikon: 32 patents #99 of 2,493Top 4%
📍 Gyōda, JP: #13 of 565 inventorsTop 3%
Overall (All Time): #113,456 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 1–25 of 32 patents

Patent #TitleCo-InventorsDate
10151983 Exposure apparatus and device manufacturing method Takashi Horiuchi 2018-12-11
10088760 Exposure apparatus, exposure method, method for producing device, and optical part Hiroyuki Nagasaka, Shigeru Hirukawa, Ryuichi Hoshika, Hitoshi Ishizawa 2018-10-02
10012909 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Hideaki Hara, Dai Arai 2018-07-03
9846371 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2017-12-19
9341959 Substrate holding device, exposure apparatus, and device manufacturing method Makoto Shibuta, Yuichi Yoshida 2016-05-17
9268237 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2016-02-23
9223224 Exposure apparatus with component from which liquid is protected and/or removed and device fabricating method Hideaki Hara 2015-12-29
9182685 Exposure apparatus, exposure method, method for producing device, and optical part Hiroyuki Nagasaka, Shigeru Hirukawa, Ryuichi Hoshika, Hitoshi Ishizawa 2015-11-10
9041901 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Hideaki Hara, Dai Arai 2015-05-26
9041906 Immersion exposure apparatus and method that detects liquid adhered to rear surface of substrate Takashi Horiuchi 2015-05-26
9019469 Exposure apparatus, exposure method, method for producing device, and optical part Hiroyuki Nagasaka, Shigeru Hirukawa, Ryuichi Hoshika, Hitoshi Ishizawa 2015-04-28
9019467 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2015-04-28
8867017 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Hideaki Hara, Dai Arai 2014-10-21
8854599 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Hideaki Hara, Dai Arai 2014-10-07
8767168 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure Takashi Horiuchi 2014-07-01
8749757 Exposure apparatus, method for producing device, and method for controlling exposure apparatus Nobutaka Magome, Naoyuki Kobayashi, Yasuyuki Sakakibara, Hisatsune Kadota 2014-06-10
8749755 Stage apparatus and exposure apparatus 2014-06-10
8508718 Wafer table having sensor for immersion lithography Andrew J. Hazelton 2013-08-13
8488101 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position Takashi Horiuchi 2013-07-16
8451424 Exposure apparatus, method for producing device, and method for controlling exposure apparatus Nobutaka Magome, Naoyuki Kobayashi, Yasuyuki Sakakibara, Hisatsune Kadota 2013-05-28
8384880 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2013-02-26
8208117 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2012-06-26
8102512 Substrate holding device, exposure apparatus, and device manufacturing method Makoto Shibuta, Yuichi Yoshida 2012-01-24
8054447 Exposure apparatus, exposure method, method for producing device, and optical part Hiroyuki Nagasaka, Shigeru Hirukawa, Ryuichi Hoshika, Hitoshi Ishizawa 2011-11-08
8034539 Exposure apparatus and method for producing device Nobutaka Magome, Dai Arai 2011-10-11