Issued Patents All Time
Showing 1–25 of 99 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12301771 | Image processing apparatus for inputting characters using touch panel, control method thereof and storage medium | — | 2025-05-13 |
| 12219103 | Image processing apparatus, control method, and non-transitory computer-readable storage medium comprising displaying a scanned image with an illustration representing one sheet or a plurality of sheets | — | 2025-02-04 |
| 12177393 | Document processing system and control method thereof | — | 2024-12-24 |
| 11843732 | Image processing apparatus for inputting characters using touch panel, control method thereof and storage medium | — | 2023-12-12 |
| 11620434 | Information processing apparatus, information processing method, and storage medium that provide a highlighting feature of highlighting a displayed character recognition area | — | 2023-04-04 |
| 11463594 | Image processing apparatus for inputting characters using touch panel, control method thereof and storage medium | — | 2022-10-04 |
| 11303769 | Image processing system that computerizes documents with notification of labeled items, control method thereof, and storage medium | — | 2022-04-12 |
| 10061214 | Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method | Natsuko Sagawa, Katsushi Nakano | 2018-08-28 |
| 9846371 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method | Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more | 2017-12-19 |
| 9798245 | Exposure apparatus, and exposure method, with recovery device to recover liquid leaked from between substrate and member | Yasufumi Nishii, Hirotaka Kohno | 2017-10-24 |
| 9645505 | Immersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid | — | 2017-05-09 |
| 9618854 | Exposure method, exposure apparatus, and device manufacturing method | Ryuichi Hoshika, Tomoharu Fujiwara | 2017-04-11 |
| 9335639 | Exposure method, exposure apparatus, and device manufacturing method | Ryuichi Hoshika, Tomoharu Fujiwara | 2016-05-10 |
| 9268237 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method | Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more | 2016-02-23 |
| 9140462 | Charged particle emission device and air-blowing device | Takahiro Hanai, Nobuhiro Iwaki | 2015-09-22 |
| 9019467 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method | Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more | 2015-04-28 |
| 8941812 | Exposure method, exposure apparatus, and device manufacturing method | Tomoharu Fujiwara | 2015-01-27 |
| 8891055 | Maintenance method, maintenance device, exposure apparatus, and device manufacturing method | Tomoharu Fujiwara, Yasufumi Nishii | 2014-11-18 |
| 8810767 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device | Hiroyuki Nagasaka, Soichi Owa, Shigeru Hirukawa | 2014-08-19 |
| 8780327 | Exposure apparatus and method for producing device | Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Katsushi Nakano, Soichi Owa | 2014-07-15 |
| 8760617 | Exposure apparatus and method for producing device | Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Katsushi Nakano, Soichi Owa | 2014-06-24 |
| 8724077 | Exposure apparatus, exposure method, and device manufacturing method | Hiroyuki Nagasaka, Tomoharu Fujiwara, Soichi Owa, Akihiro Miwa | 2014-05-13 |
| 8704997 | Immersion lithographic apparatus and method for rinsing immersion space before exposure | — | 2014-04-22 |
| 8698998 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device | Hiroyuki Nagasaka, Soichi Owa, Shigeru Hirukawa | 2014-04-15 |
| 8654306 | Exposure apparatus, cleaning method, and device fabricating method | Yosuke Shirata, Masahiko Okumura | 2014-02-18 |