| 7652272 |
Plasma-based debris mitigation for extreme ultraviolet (EUV) light source |
David N. Ruzic, Robert L. Bristol |
2010-01-26 |
| 7567379 |
Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system |
Robert L. Bristol, Ming Fang, John Barnak, Melissa Shell |
2009-07-28 |
| 7527920 |
Active hardmask for lithographic patterning |
Michael Goldstein, Manish Chandhok, Eric Panning, Robert L. Bristol |
2009-05-05 |
| 7446329 |
Erosion resistance of EUV source electrodes |
Robert L. Bristol, Arun Ramamoorthy |
2008-11-04 |
| 7329588 |
Forming a reticle for extreme ultraviolet radiation and structures formed thereby |
Kramadhati V. Ravi |
2008-02-12 |
| 7230258 |
Plasma-based debris mitigation for extreme ultraviolet (EUV) light source |
David N. Ruzic, Robert L. Bristol |
2007-06-12 |
| 7208747 |
Adjustment of distance between source plasma and mirrors to change partial coherence |
Manish Chandhok, Eric Panning |
2007-04-24 |
| 7180082 |
Method for plasma formation for extreme ultraviolet lithography-theta pinch |
Ahmed Hassanein, Isak Konkashbaev |
2007-02-20 |
| 7153615 |
Extreme ultraviolet pellicle using a thin film and supportive mesh |
Robert L. Bristol |
2006-12-26 |
| 7109504 |
Extreme ultraviolet illumination source |
Manish Chandhok, Eric Panning |
2006-09-19 |
| 7098466 |
Adjustable illumination source |
Manish Chandhok, Eric Panning |
2006-08-29 |
| 7078700 |
Optics for extreme ultraviolet lithography |
Manish Chandhok, Robert L. Bristol |
2006-07-18 |
| 7049614 |
Electrode in a discharge produced plasma extreme ultraviolet source |
— |
2006-05-23 |
| 7033739 |
Active hardmask for lithographic patterning |
Michael Goldstein, Manish Chandhok, Eric Panning, Robert L. Bristol |
2006-04-25 |
| 6847044 |
Electrical discharge gas plasma EUV source insulator components |
Kramadhati V. Ravi |
2005-01-25 |
| 6787788 |
Electrode insulator materials for use in extreme ultraviolet electric discharge sources |
Melissa Shell |
2004-09-07 |