Issued Patents All Time
Showing 25 most recent of 80 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261057 | Textile patterning for subtractively-patterned self-aligned interconnects, plugs, and vias | Kevin Lin, Alan M. Myers | 2025-03-25 |
| 12218052 | Advanced lithography and self-assembled devices | Richard E. Schenker, Kevin Lin, Florian Gstrein, James M. Blackwell, Marie Krysak +6 more | 2025-02-04 |
| 12165987 | Frame reveals with maskless lithography in the manufacture of integrated circuits | Grant Kloster | 2024-12-10 |
| 12107044 | Metal oxycarbide resists as leave behind plugs | Marie Krysak, Kevin Lin, Charles H. Wallace | 2024-10-01 |
| 12037434 | Chemical compositions and methods of patterning microelectronic device structures | Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Florian Gstrein, Lauren Doyle +2 more | 2024-07-16 |
| 12012473 | Directed self-assembly structures and techniques | James M. Blackwell, Xuanxuan Chen, Lauren Doyle, Florian Gstrein, Eungnak Han +6 more | 2024-06-18 |
| 11955343 | Two-stage bake photoresist with releasable quencher | Marie Krysak, James M. Blackwell, Florian Gstrein, Kent N. FRASURE | 2024-04-09 |
| 11955377 | Differential hardmasks for modulation of electrobucket sensitivity | Kevin Lin, James M. Blackwell, Rami Hourani, Marie Krysak | 2024-04-09 |
| 11953826 | Lined photobucket structure for back end of line (BEOL) interconnect formation | James M. Blackwell, Marie Krysak, Florian Gstrein, Eungnak Han, Kevin Lin +2 more | 2024-04-09 |
| 11874600 | Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists | Marie Krysak, James M. Blackwell, Florian Gstrein | 2024-01-16 |
| 11854787 | Advanced lithography and self-assembled devices | Richard E. Schenker, Kevin Lin, Florian Gstrein, James M. Blackwell, Marie Krysak +6 more | 2023-12-26 |
| 11854882 | Subtractive plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnects | Kevin Lin, Richard E. Schenker | 2023-12-26 |
| 11846883 | Chain scission photoresists and methods for forming chain scission photoresists | Marie Krysak, Lauren Doyle, James M. Blackwell, Eungnak Han | 2023-12-19 |
| 11594599 | Quantum dot array devices | James S. Clarke, Ravi Pillarisetty, Jeanette M. Roberts, Hubert C. George, Nicole K. Thomas | 2023-02-28 |
| 11373900 | Damascene plug and tab patterning with photobuckets | Kevin Lin, Richard E. Schenker | 2022-06-28 |
| 11373950 | Advanced lithography and self-assembled devices | Richard E. Schenker, Kevin Lin, Florian Gstrein, James M. Blackwell, Marie Krysak +6 more | 2022-06-28 |
| 11320734 | Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists | Marie Krysak, James M. Blackwell, Florian Gstrein | 2022-05-03 |
| 11315798 | Two-stage bake photoresist with releasable quencher | Marie Krysak, James M. Blackwell, Florian Gstrein, Kent N. FRASURE | 2022-04-26 |
| 11300885 | EUV phase-shift SRAF masks by means of embedded phase shift layers | Guojing Zhang, Tristan A. Tronic, John Magana, Chang Ju Choi, Arvind Sundaramurthy +1 more | 2022-04-12 |
| 11276581 | Textile patterning for subtractively-patterned self-aligned interconnects, plugs, and vias | Kevin Lin, Alan M. Myers | 2022-03-15 |
| 11251072 | Differential hardmasks for modulation of electrobucket sensitivity | Kevin Lin, James M. Blackwell, Rami Hourani, Marie Krysak | 2022-02-15 |
| 11189790 | Spacer-based patterning for tight-pitch and low-variability random access memory (RAM) bit cells and the resulting structures | Kevin Lin, Sarah Atanasov, Kevin P. O'Brien | 2021-11-30 |
| 11137681 | Lined photobucket structure for back end of line (BEOL) interconnect formation | James M. Blackwell, Marie Krysak, Florian Gstrein, Eungnak Han, Kevin Lin +2 more | 2021-10-05 |
| 11069609 | Techniques for forming vias and other interconnects for integrated circuit structures | Sasikanth Manipatruni, Jasmeet S. Chawla, Chia-Ching Lin, Dmitri E. Nikonov, Ian A. Young | 2021-07-20 |
| 10957844 | Magneto-electric spin orbit (MESO) structures having functional oxide vias | Jasmeet S. Chawla, Sasikanth Manipatruni, Chia-Ching Lin, Dmitri E. Nikonov, Ian A. Young | 2021-03-23 |