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Real-time detection of deflections and ruptures of EUV pellicle membranes |
John Magana |
2025-01-28 |
| 11604406 |
Method and apparatus for fabrication of very large scale integration pattern features via electroless deposition on extreme ultraviolet lithography photomasks |
John Magana, Yang Cao |
2023-03-14 |
| 11561466 |
Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits |
John Magana |
2023-01-24 |
| 11300885 |
EUV phase-shift SRAF masks by means of embedded phase shift layers |
Robert L. Bristol, Tristan A. Tronic, John Magana, Chang Ju Choi, Arvind Sundaramurthy +1 more |
2022-04-12 |
| 11194246 |
Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits |
John Magana |
2021-12-07 |
| 6908714 |
Absorber layer for EUV |
Pei-Yang Yan |
2005-06-21 |
| 6905801 |
High performance EUV mask |
Shoudeng Liang, Pei-Yang Yan |
2005-06-14 |
| 6720118 |
Enhanced inspection of extreme ultraviolet mask |
Pei-Yang Yan, Ted Liang |
2004-04-13 |
| 6610447 |
Extreme ultraviolet mask with improved absorber |
Pei-Yang Yan |
2003-08-26 |
| 6583068 |
Enhanced inspection of extreme ultraviolet mask |
Pei-Yang Yan, Ted Liang |
2003-06-24 |
| 5958629 |
Using thin films as etch stop in EUV mask fabrication process |
Pei-Yang Yan, Joseph C. Langston |
1999-09-28 |
| 5928817 |
Method of protecting an EUV mask from damage and contamination |
Pei-Yang Yan |
1999-07-27 |