Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12209975 | Real-time detection of deflections and ruptures of EUV pellicle membranes | John Magana | 2025-01-28 |
| 11604406 | Method and apparatus for fabrication of very large scale integration pattern features via electroless deposition on extreme ultraviolet lithography photomasks | John Magana, Yang Cao | 2023-03-14 |
| 11561466 | Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits | John Magana | 2023-01-24 |
| 11300885 | EUV phase-shift SRAF masks by means of embedded phase shift layers | Robert L. Bristol, Tristan A. Tronic, John Magana, Chang Ju Choi, Arvind Sundaramurthy +1 more | 2022-04-12 |
| 11194246 | Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits | John Magana | 2021-12-07 |
| 6908714 | Absorber layer for EUV | Pei-Yang Yan | 2005-06-21 |
| 6905801 | High performance EUV mask | Shoudeng Liang, Pei-Yang Yan | 2005-06-14 |
| 6720118 | Enhanced inspection of extreme ultraviolet mask | Pei-Yang Yan, Ted Liang | 2004-04-13 |
| 6610447 | Extreme ultraviolet mask with improved absorber | Pei-Yang Yan | 2003-08-26 |
| 6583068 | Enhanced inspection of extreme ultraviolet mask | Pei-Yang Yan, Ted Liang | 2003-06-24 |
| 5958629 | Using thin films as etch stop in EUV mask fabrication process | Pei-Yang Yan, Joseph C. Langston | 1999-09-28 |
| 5928817 | Method of protecting an EUV mask from damage and contamination | Pei-Yang Yan | 1999-07-27 |