Pei-Yang Yan has been granted 35 US patents while listed as an inventor at Intel . The first was granted in 1994 and the most recent in July 2010. Pei-Yang Yan ranks #96,288 of 4,157,543 US inventors in our database (top 2.3%). Patent records list Pei-Yang Yan in Saratoga, CA, US.
Patents per Year Patents granted per year, 1994 to 2010 Bar chart with a peak of 7 patents in 2003. peak 7 1994: 1 patents 1994 1999: 3 patents 2001: 2 patents 2001 2002: 2 patents 2003: 7 patents 2003 2004: 6 patents 2005: 3 patents 2005 2006: 5 patents 2007: 1 patents 2007 2008: 2 patents 2009: 2 patents 2009 2010: 1 patents 2010
Issued Patents All Time
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Showing 1–25 of 35 patents
Patent # Title Co-Inventors Date Approx Value ⓘ
7759022 Phase shift mask structure and fabrication process — 2010-07-20
$9,455,000
7556894 Mask with minimum reflectivity over absorber layer — 2009-07-07
$37,451,000
7534532 Method to correct EUVL mask substrate non-flatness — 2009-05-19
$16,372,000
7452637 Method and apparatus for clean photomask handling — 2008-11-18
$14,632,000
7410733 Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallel Hsing-Chien Ma , Scott R. Chegwidden 2008-08-12
$20,410,000
7300724 Interference multilayer capping design for multilayer reflective mask blanks — 2007-11-27
$22,929,000
7118832 Reflective mask with high inspection contrast — 2006-10-10
$14,351,000
7083881 Photomasking — 2006-08-01
$14,842,000
7078136 Thermally-generated mask pattern — 2006-07-18
$11,508,000
6998203 Proximity correcting lithography mask blanks — 2006-02-14
$11,997,000
6998202 Multilayer reflective extreme ultraviolet lithography mask blanks — 2006-02-14
$11,997,000
6913706 Double-metal EUV mask absorber Hsing-Chien Ma , Scott R. Chegwidden 2005-07-05
$31,328,000
6908714 Absorber layer for EUV Guojing Zhang 2005-06-21
$21,477,000
6905801 High performance EUV mask Shoudeng Liang , Guojing Zhang 2005-06-14
$24,999,000
6830851 Photolithographic mask fabrication — 2004-12-14
$39,074,000
6818357 Photolithographic mask fabrication — 2004-11-16
$29,403,000
6818361 Photomasking — 2004-11-16
$29,403,000
6756158 Thermal generation of mask pattern — 2004-06-29
$34,137,000
6756163 Re-usable extreme ultraviolet lithography multilayer mask blank — 2004-06-29
$34,137,000
6720118 Enhanced inspection of extreme ultraviolet mask Ted Liang , Guojing Zhang 2004-04-13
$35,249,000
6641959 Absorberless phase-shifting mask for EUV — 2003-11-04
$42,713,000
6630273 Method to fabricate extreme ultraviolet lithography masks Mark Thiec-Hien Tran 2003-10-07
$52,834,000
6610447 Extreme ultraviolet mask with improved absorber Guojing Zhang 2003-08-26
$50,823,000
6607862 Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making Fu-Chang Lo 2003-08-19
$57,835,000
6593041 Damascene extreme ultraviolet lithography (EUVL) photomask and method of making — 2003-07-15
$37,859,000
