Issued Patents All Time
Showing 25 most recent of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7759022 | Phase shift mask structure and fabrication process | — | 2010-07-20 |
| 7556894 | Mask with minimum reflectivity over absorber layer | — | 2009-07-07 |
| 7534532 | Method to correct EUVL mask substrate non-flatness | — | 2009-05-19 |
| 7452637 | Method and apparatus for clean photomask handling | — | 2008-11-18 |
| 7410733 | Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallel | Hsing-Chien Ma, Scott R. Chegwidden | 2008-08-12 |
| 7300724 | Interference multilayer capping design for multilayer reflective mask blanks | — | 2007-11-27 |
| 7118832 | Reflective mask with high inspection contrast | — | 2006-10-10 |
| 7083881 | Photomasking | — | 2006-08-01 |
| 7078136 | Thermally-generated mask pattern | — | 2006-07-18 |
| 6998203 | Proximity correcting lithography mask blanks | — | 2006-02-14 |
| 6998202 | Multilayer reflective extreme ultraviolet lithography mask blanks | — | 2006-02-14 |
| 6913706 | Double-metal EUV mask absorber | Hsing-Chien Ma, Scott R. Chegwidden | 2005-07-05 |
| 6908714 | Absorber layer for EUV | Guojing Zhang | 2005-06-21 |
| 6905801 | High performance EUV mask | Shoudeng Liang, Guojing Zhang | 2005-06-14 |
| 6830851 | Photolithographic mask fabrication | — | 2004-12-14 |
| 6818357 | Photolithographic mask fabrication | — | 2004-11-16 |
| 6818361 | Photomasking | — | 2004-11-16 |
| 6756158 | Thermal generation of mask pattern | — | 2004-06-29 |
| 6756163 | Re-usable extreme ultraviolet lithography multilayer mask blank | — | 2004-06-29 |
| 6720118 | Enhanced inspection of extreme ultraviolet mask | Ted Liang, Guojing Zhang | 2004-04-13 |
| 6641959 | Absorberless phase-shifting mask for EUV | — | 2003-11-04 |
| 6630273 | Method to fabricate extreme ultraviolet lithography masks | Mark Thiec-Hien Tran | 2003-10-07 |
| 6610447 | Extreme ultraviolet mask with improved absorber | Guojing Zhang | 2003-08-26 |
| 6607862 | Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making | Fu-Chang Lo | 2003-08-19 |
| 6593041 | Damascene extreme ultraviolet lithography (EUVL) photomask and method of making | — | 2003-07-15 |