Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Interference multilayer capping design for multilayer reflective mask blanks

Interference multilayer capping design for multilayer reflective mask blanks

US Patent 7300724 · Granted Nov 27, 2007

Estimated economic value: $22,929,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Phase shift mask structure and fabrication process2010
Mask with minimum reflectivity over absorber layer2009
Method to correct EUVL mask substrate non-flatness2009
Method and apparatus for clean photomask handling2008
Dual-layer EUV mask absorber with trenches having opposing sidewalls that are st2008
Reflective mask with high inspection contrast2006
Photomasking2006
Thermally-generated mask pattern2006
Multilayer reflective extreme ultraviolet lithography mask blanks2006
Proximity correcting lithography mask blanks2006
Double-metal EUV mask absorber2005
Absorber layer for EUV2005