Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Real-time detection of deflections and ruptures of EUV pellicle membranes

Real-time detection of deflections and ruptures of EUV pellicle membranes

US Patent 12209975 · Granted Jan 28, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for fabrication of very large scale integration pattern fea2023
Method and apparatus for fabrication of very large scale integration pattern fea2023
Monolithically framed pellicle membrane suitable for lithography in the fabricat2023
Monolithically framed pellicle membrane suitable for lithography in the fabricat2023
EUV phase-shift SRAF masks by means of embedded phase shift layers2022
EUV phase-shift SRAF masks by means of embedded phase shift layers2022
Monolithically framed pellicle membrane suitable for lithography in the fabricat2021
Monolithically framed pellicle membrane suitable for lithography in the fabricat2021
EPI substrate with low doped EPI layer and high doped Si substrate layer for med2011
Wafer scale fabrication of liquid crystal on silicon light modulation devices2010
Absorber layer for EUV2005
High performance EUV mask2005