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Real-time detection of deflections and ruptures of EUV pellicle membranes |
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Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits |
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EUV phase-shift SRAF masks by means of embedded phase shift layers |
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Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits |
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EPI substrate with low doped EPI layer and high doped Si substrate layer for media growth on EPI and low contact resistance to back-side substrate |
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Wafer scale fabrication of liquid crystal on silicon light modulation devices |
— |
2010-04-06 |
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Wafer level electro-optical sort testing and wafer level assembly of micro liquid crystal-on silicon (LCOS) devices |
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