Issued Patents All Time
Showing 51–75 of 80 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9418888 | Non-lithographically patterned directed self assembly alignment promotion layers | Rami Hourani, Eungnak Han, James M. Blackwell | 2016-08-16 |
| 9406512 | Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnects | James M. Blackwell, Alan M. Myers, Kanwal Jit Singh | 2016-08-02 |
| 9285682 | Pre-patterned hard mask for ultrafast lithographic imaging | Paul A. Nyhus, Charles H. Wallace | 2016-03-15 |
| 9236342 | Self-aligned via and plug patterning with photobuckets for back end of line (BEOL) interconnects | Kevin Lin, Kanwal Jit Singh, Alan M. Myers, Richard E. Schenker | 2016-01-12 |
| 9209077 | Diagonal hardmasks for improved overlay in fabricating back end of line (BEOL) interconnects | Alan M. Myers, Kanwal Jit Singh, Jasmeet S. Chawla | 2015-12-08 |
| 9153477 | Directed self assembly of block copolymers to form vias aligned with interconnects | Paul A. Nyhus, Swaninathan Sivakumar | 2015-10-06 |
| 9041217 | Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnects | James M. Blackwell, Alan M. Myers, Kanwal Jit Singh | 2015-05-26 |
| 9005875 | Pre-patterned hard mask for ultrafast lithographic imaging | Paul A. Nyhus, Charles H. Wallace | 2015-04-14 |
| 8993404 | Metal-insulator-metal capacitor formation techniques | Mauro J. Kobrinsky, Michael C. Mayberry | 2015-03-31 |
| 7825424 | Methods to manufacture contaminant-gettering materials in the surface of EUV optics | Bruce H. Billett | 2010-11-02 |
| 7652272 | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source | David N. Ruzic, Bryan Rice | 2010-01-26 |
| 7567379 | Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system | Bryan Rice, Ming Fang, John Barnak, Melissa Shell | 2009-07-28 |
| 7527920 | Active hardmask for lithographic patterning | Michael Goldstein, Manish Chandhok, Eric Panning, Bryan Rice | 2009-05-05 |
| 7446329 | Erosion resistance of EUV source electrodes | Arun Ramamoorthy, Bryan Rice | 2008-11-04 |
| 7423275 | Erosion mitigation for collector optics using electric and magnetic fields | Sang Hun Lee, Arun Ramamoorthy | 2008-09-09 |
| 7413586 | In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles | Arun Ramamoorthy | 2008-08-19 |
| 7374867 | Enhancing photoresist performance using electric fields | Heidi Cao, Manish Chandhok, Robert Meagley, Vijayakumar Ramachandrarao | 2008-05-20 |
| 7355190 | Debris mitigation device | — | 2008-04-08 |
| 7332416 | Methods to manufacture contaminant-gettering materials in the surface of EUV optics | Bruce H. Billett | 2008-02-19 |
| 7230258 | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source | David N. Ruzic, Bryan Rice | 2007-06-12 |
| 7195021 | In-situ cleaning of light source collector optics | Michael Chan, Mark L. Doczy | 2007-03-27 |
| 7153615 | Extreme ultraviolet pellicle using a thin film and supportive mesh | Bryan Rice | 2006-12-26 |
| 7078700 | Optics for extreme ultraviolet lithography | Manish Chandhok, Bryan Rice | 2006-07-18 |
| 7041993 | Protective coatings for radiation source components | Manish Chandhok, Kramadhati V. Ravi, Melissa Shell | 2006-05-09 |
| 7033739 | Active hardmask for lithographic patterning | Michael Goldstein, Manish Chandhok, Eric Panning, Bryan Rice | 2006-04-25 |