Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7567379 | Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system | Robert L. Bristol, Bryan Rice, Ming Fang, Melissa Shell | 2009-07-28 |
| 7316949 | Integrating n-type and p-type metal gate transistors | Mark L. Doczy, Justin K. Brask, Steven J. Keating, Chris Barns, Brian S. Doyle +2 more | 2008-01-08 |
| 7122870 | Methods of forming a multilayer stack alloy for work function engineering | Collin Borla, Mark L. Doczy, Markus Kuhn, Jacob Jensen | 2006-10-17 |
| 7087521 | Forming an intermediate layer in interconnect joints and structures formed thereby | Mukul Renavikar | 2006-08-08 |
| 7064446 | Under bump metallization layer to enable use of high tin content solder bumps | Gerald Feldewerth, Ming Fang, Kevin J. Lee, Tzuen-Luh Huang, Harry Liang +3 more | 2006-06-20 |
| 7022559 | MOSFET gate electrodes having performance tuned work functions and methods of making same | Robert S. Chau, Chunlin Liang | 2006-04-04 |
| 6972225 | integrating n-type and P-type metal gate transistors | Mark L. Doczy, Justin K. Brask, Steven J. Keating, Chris Barns, Brian S. Doyle +2 more | 2005-12-06 |
| 6953719 | Integrating n-type and p-type metal gate transistors | Mark L. Doczy, Justin K. Brask, Steven J. Keating, Chris Barns, Brian S. Doyle +2 more | 2005-10-11 |
| 6939815 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, Scott A. Hareland, Matthew V. Metz, Jack T. Kavalieros +1 more | 2005-09-06 |
| 6897134 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, Robert S. Chau | 2005-05-24 |
| 6867102 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, Ying Zhou | 2005-03-15 |
| 6858483 | Integrating n-type and p-type metal gate transistors | Mark L. Doczy, Justin K. Brask, Steven J. Keating, Chris Barns, Brian S. Doyle +2 more | 2005-02-22 |
| 6855639 | Precise patterning of high-K films | Justin K. Brask, Mark L. Doczy, Matthew V. Metz, Paul Markworth | 2005-02-15 |
| 6849509 | Methods of forming a multilayer stack alloy for work function engineering | Collin Borla, Mark L. Doczy, Markus Kuhn, Jacob Jensen | 2005-02-01 |
| 6806146 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, Ying Zhou | 2004-10-19 |
| 6709911 | Method for making a semiconductor device having a high-k gate dielectric | Mark L. Doczy, Justin K. Brask | 2004-03-23 |
| 6696327 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, Robert S. Chau | 2004-02-24 |