Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12287569 | Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography | Yousuke ONO, Hisako ISHIKAWA, Ryohei Ogawa, Atsushi Okubo, Kazuo Kohmura +3 more | 2025-04-29 |
| 10392520 | Carbon nanotube composite film and method for producing said composite film | Reiko Azumi, Satoru Shimada | 2019-08-27 |
| 10148416 | Signal phase optimization in memory interface training | Tonia G. Morris, John V. Lovelace, Alberto David Perez Guevara | 2018-12-04 |
| 9984922 | Interconnects having sealing structures to enable selective metal capping layers | Jun He, Kevin J. Fischer, Peter K. Moon | 2018-05-29 |
| 9437545 | Interconnects having sealing structures to enable selective metal capping layers | Jun He, Kevin J. Fischer, Peter K. Moon | 2016-09-06 |
| 9237000 | Transceiver clock architecture with transmit PLL and receive slave delay lines | Aaron Martin, Hon-Mo Law, Joe Salmon, Derek M. Conrow | 2016-01-12 |
| 8928125 | Interconnects having sealing structures to enable selective metal capping layers | Jun He, Kevin J. Fischer, Peter K. Moon | 2015-01-06 |
| 8058710 | Interconnects having sealing structures to enable selective metal capping layers | Jun He, Kevin J. Fischer, Peter K. Moon | 2011-11-15 |
| 7545194 | Programmable delay for clock phase error correction | Suwei Chen, Aaron Martin | 2009-06-09 |
| 7402509 | Method of forming self-passivating interconnects and resulting devices | Mauro J. Kobrinsky, Jun He, Kevin P. O'Brien, Patrick Morrow, Shriram Ramanathan | 2008-07-22 |
| 7402519 | Interconnects having sealing structures to enable selective metal capping layers | Jun He, Kevin J. Fischer, Peter K. Moon | 2008-07-22 |
| 7192890 | Depositing an oxide | Matthew V. Metz, Justin K. Brask, John Burghard, Markus Kuhn, Suman Datta +1 more | 2007-03-20 |
| 7071129 | Enhancing adhesion of silicon nitride films to carbon-containing oxide films | Chia-Hong Jan, Tracey Scherban, Adam J. Schafer, Brett Schroeder | 2006-07-04 |
| 6867102 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, John Barnak | 2005-03-15 |
| 6806146 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, John Barnak | 2004-10-19 |
| 6787440 | Method for making a semiconductor device having an ultra-thin high-k gate dielectric | Christopher Parker, Markus Kuhn, Scott A. Hareland, Suman Datta, Nick Lindert +4 more | 2004-09-07 |
| 6689675 | Method for making a semiconductor device having a high-k gate dielectric | Christopher Parker, Markus Kuhn | 2004-02-10 |
| 6605549 | Method for improving nucleation and adhesion of CVD and ALD films deposited onto low-dielectric-constant dielectrics | Jihperng Leu, Chih-I Wu, Grant Kloster | 2003-08-12 |