Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Forming a reticle for extreme ultraviolet radiation and structures formed thereby

Forming a reticle for extreme ultraviolet radiation and structures formed thereby

US Patent 7329588 · Granted Feb 12, 2008

Estimated economic value: $36,180,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Fabrication of stacked die and structures formed thereby2016
Method of fabricating a metal wrap through solar cell2016
Apparatus to minimize thermal impedance using copper on die backside2016
Silicon heterojunction solar cells2016
MWT architecture for thin SI solar cells2014
Passivated emitter rear locally patterned epitaxial solar cell2014
Stressed semiconductor using carbon and method for producing the same2012
Method of forming porous diamond films for semiconductor applications2012
Semiconductor substrate with islands of diamond and resulting devices2011
Stressed semiconductor using carbon and method for producing the same2010
Plasma-based debris mitigation for extreme ultraviolet (EUV) light source2010
Formation of dielectric film by alternating between deposition and modification2009