Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Extreme ultraviolet pellicle using a thin film and supportive mesh

Extreme ultraviolet pellicle using a thin film and supportive mesh

US Patent 7153615 · Granted Dec 26, 2006

Estimated economic value: $11,208,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Textile patterning for subtractively-patterned self-aligned interconnects, plugs2025
Advanced lithography and self-assembled devices2025
Frame reveals with maskless lithography in the manufacture of integrated circuit2024
Metal oxycarbide resists as leave behind plugs2024
Chemical compositions and methods of patterning microelectronic device structure2024
Directed self-assembly structures and techniques2024
Lined photobucket structure for back end of line (BEOL) interconnect formation2024
Two-stage bake photoresist with releasable quencher2024
Differential hardmasks for modulation of electrobucket sensitivity2024
Ligand-capped main group nanoparticles as high absorption extreme ultraviolet li2024
Advanced lithography and self-assembled devices2023
Subtractive plug and tab patterning with photobuckets for back end of line (BEOL2023