Issued Patents All Time
Showing 51–75 of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7977032 | Method to create region specific exposure in a layer | Christos D. Dimitrakopoulos, Daniel C. Edelstein, Vincent J. McGahay, Kevin S. Petrarca, Shom Ponoth +1 more | 2011-07-12 |
| 7968450 | Methods for incorporating high dielectric materials for enhanced SRAM operation and structures produced thereby | Azeez Bhavnagarwala, Stephen V. Kosonocky, Sampath Purushothaman | 2011-06-28 |
| 7947907 | Electronics structures using a sacrificial multi-layer hardmask scheme | Matthew E. Colburn, Ricardo A. Donaton, Conal E. Murray, Sampath Purushothaman, Sujatha Sankaran +2 more | 2011-05-24 |
| 7948051 | Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same | Matthew E. Colburn, Stephen M. Gates, Jeffrey Hedrick, Elbert E. Huang, Sampath Purushothaman +1 more | 2011-05-24 |
| 7943480 | Sub-lithographic dimensioned air gap formation and related structure | Daniel C. Edelstein, Nicholas C. M. Fuller, David V. Horak, Elbert E. Huang, Wai-Kin Li +2 more | 2011-05-17 |
| 7892940 | Device and methodology for reducing effective dielectric constant in semiconductor devices | Daniel C. Edelstein, Matthew E. Colburn, Edward C. Cooney, III, Timothy J. Dalton, John A. Fitzsimmons +10 more | 2011-02-22 |
| 7884477 | Air gap structure having protective metal silicide pads on a metal feature | Griselda Bonilla, Daniel C. Edelstein, Takeshi Nogami, Shom Ponoth, David L. Rath +1 more | 2011-02-08 |
| 7790601 | Forming interconnects with air gaps | Samuel S. Choi, Lawrence A. Clevenger, Maxime Darnon, Daniel C. Edelstein, Shom Ponoth +1 more | 2010-09-07 |
| 7749892 | Embedded nano UV blocking and diffusion barrier for improved reliability of copper/ultra low K interlevel dielectric electronic devices | Griselda Bonilla, Christos D. Dimitrakopoulos, Son V. Nguyen, Alfred Grill, Darryl D. Restaino +1 more | 2010-07-06 |
| 7687913 | Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics | Nirupama Chakrapani, Matthew E. Colburn, Christos D. Dimitrakopoulos, Dirk Pfeiffer, Sampath Purushothaman | 2010-03-30 |
| 7592685 | Device and methodology for reducing effective dielectric constant in semiconductor devices | Daniel C. Edelstein, Matthew E. Colburn, Edward C. Cooney, III, Timothy J. Dalton, John A. Fitzsimmons +10 more | 2009-09-22 |
| 7534696 | Multilayer interconnect structure containing air gaps and method for making | Christopher V. Jahnes, Kevin S. Petrarca, Katherine L. Saenger | 2009-05-19 |
| 7517637 | Method of producing self-aligned mask in conjunction with blocking mask, articles produced by same and composition for same | Matthew E. Colburn, Sampath Purushothaman | 2009-04-14 |
| 7485341 | Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same | Matthew E. Colburn, Stephen M. Gates, Jeffrey Hedrick, Elbert E. Huang, Sampath Purushothaman +1 more | 2009-02-03 |
| 7435676 | Dual damascene process flow enabling minimal ULK film modification and enhanced stack integrity | Timothy J. Dalton, Nicholas C. M. Fuller | 2008-10-14 |
| 7405147 | Device and methodology for reducing effective dielectric constant in semiconductor devices | Daniel C. Edelstein, Matthew E. Colburn, Edward C. Cooney, III, Timothy J. Dalton, John A. Fitzsimmons +10 more | 2008-07-29 |
| 7371684 | Process for preparing electronics structures using a sacrificial multilayer hardmask scheme | Matthew E. Colburn, Ricardo A. Donaton, Conal E. Murray, Sampath Purushothaman, Sujatha Sankaran +2 more | 2008-05-13 |
| 7179758 | Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics | Nirupama Chakrapani, Matthew E. Colburn, Christos D. Dimitrakopoulos, Dirk Pfeiffer, Sampath Purushothaman | 2007-02-20 |
| 7084479 | Line level air gaps | Shyng-Tsong Chen, Stefanie Chiras, Matthew E. Colburn, Timothy J. Dalton, Jeffrey Hedrick +9 more | 2006-08-01 |
| 7037744 | Method for fabricating a self-aligned nanocolumnar airbridge and structure produced thereby | Matthew E. Colburn, Sampath Purushothaman | 2006-05-02 |
| 7030495 | Method for fabricating a self-aligned nanocolumnar airbridge and structure produced thereby | Matthew E. Colburn, Sampath Purushothaman | 2006-04-18 |
| 6943451 | Semiconductor devices containing a discontinuous cap layer and methods for forming same | Stanley Joseph Whitehair, Stephen M. Gates, Sampath Purushothaman, Maurice McGlashan-Powell, Kevin S. Petrarca | 2005-09-13 |
| 6930034 | Robust ultra-low k interconnect structures using bridge-then-metallization fabrication sequence | Matthew E. Colburn, Elbert E. Huang, Sampath Purushothaman, Katherine L. Saenger | 2005-08-16 |
| 6911400 | Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same | Matthew E. Colburn, Stephen M. Gates, Jeffrey Hedrick, Elbert E. Huang, Sampath Purushothaman +1 more | 2005-06-28 |
| 6831364 | Method for forming a porous dielectric material layer in a semiconductor device and device formed | Timothy J. Dalton, Stephen E. Greco, Jeffrey Hedrick, Sampath Purushothaman, Kenneth P. Rodbell +1 more | 2004-12-14 |