Issued Patents All Time
Showing 76–89 of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6831366 | Interconnects containing first and second porous low-k dielectrics separated by a porous buried etch stop layer | Stephen M. Gates, Jeffrey Hedrick, Sampath Purushothaman, Cristy Sensenich Tyberg | 2004-12-14 |
| 6780499 | Ordered two-phase dielectric film, and semiconductor device containing the same | Stephen M. Gates, Christopher B. Murray, Sampath Purushothaman | 2004-08-24 |
| 6737725 | Multilevel interconnect structure containing air gaps and method for making | Alfred Grill, Jeffrey Hedrick, Christopher V. Jahnes, Kevin S. Petrarca, Sampath Purushothaman +2 more | 2004-05-18 |
| 6734096 | Fine-pitch device lithography using a sacrificial hardmask | Timothy J. Dalton, Minakshisundaran Balasubramanian Anand, Michael D. Armacost, Shyng-Tsong Chen, Stephen M. Gates +2 more | 2004-05-11 |
| 6724069 | Spin-on cap layer, and semiconductor device containing same | Timothy J. Dalton, Stephen M. Gates, Jeffrey Hedrick, Sampath Purushothaman, Christy S. Tyberg | 2004-04-20 |
| 6716742 | Low-k interconnect structure comprised of a multilayer of spin-on porous dielectrics | Stephen M. Gates, Jeffrey Hedrick, Sampath Purushothaman, Cristy Sensenich Tyberg | 2004-04-06 |
| 6710450 | Interconnect structure with precise conductor resistance and method to form same | Stephen M. Gates, Jeffrey Hedrick, Sampath Purushothaman, Cristy Sensenich Tyberg | 2004-03-23 |
| 6677680 | Hybrid low-k interconnect structure comprised of 2 spin-on dielectric materials | Stephen M. Gates, Jeffrey Hedrick, Sampath Purushothaman, Cristy Sensenich Tyberg | 2004-01-13 |
| 6641899 | Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same | Matthew E. Colburn, Stephen M. Gates, Jeffrey Hedrick, Elbert E. Huang, Sampath Purushothaman +1 more | 2003-11-04 |
| 6603204 | Low-k interconnect structure comprised of a multilayer of spin-on porous dielectrics | Stephen M. Gates, Jeffrey Hedrick, Sampath Purushothaman, Cristy Sensenich Tyberg | 2003-08-05 |
| 6537908 | Method for dual-damascence patterning of low-k interconnects using spin-on distributed hardmask | Ann R. Fornof, Stephen M. Gates, Jeffrey Hedrick, Sampath Purushothaman, Christy S. Tyberg | 2003-03-25 |
| 6451712 | Method for forming a porous dielectric material layer in a semiconductor device and device formed | Timothy J. Dalton, Stephen E. Greco, Jeffrey Hedrick, Sampath Purushothaman, Kenneth P. Rodbell +1 more | 2002-09-17 |
| 6413852 | Method of forming multilevel interconnect structure containing air gaps including utilizing both sacrificial and placeholder material | Alfred Grill, Jeffrey Hedrick, Christopher V. Jahnes, Kevin S. Petrarca, Sampath Purushothaman +2 more | 2002-07-02 |
| 6346484 | Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures | John M. Cotte, Christopher V. Jahnes, Kenneth McCullough, Wayne M. Moreau, Katherine L. Saenger +1 more | 2002-02-12 |