Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10141188 | Resist having tuned interface hardmask layer for EUV exposure | Ravi K. Bonam, Anuja E. DeSilva, Scott D. Halle | 2018-11-27 |
| 10134592 | Resist having tuned interface hardmask layer for EUV exposure | Ravi K. Bonam, Anuja E. DeSilva, Scott D. Halle | 2018-11-20 |
| 9929012 | Resist having tuned interface hardmask layer for EUV exposure | Ravi K. Bonam, Anuja E. DeSilva, Scott D. Halle | 2018-03-27 |
| 9613956 | Self-aligned punchthrough stop doping in bulk finFET by reflowing doped oxide | Kangguo Cheng, Ramachandra Divakaruni | 2017-04-04 |
| 9397002 | Self-aligned punchthrough stop doping in bulk finFET by reflowing doped oxide | Kangguo Cheng, Ramachandra Divakaruni | 2016-07-19 |
| 8557649 | Method for controlling structure height | Rajasekhar Venigalla, Michael V. Aquilino, Massud Aminpur, Unoh Kwon, Christopher D. Sheraw +1 more | 2013-10-15 |
| 8420542 | Method of patterned image reversal | Viraj Y. Sardesai, Rajasekhar Venigalla | 2013-04-16 |
| 7863646 | Dual oxide stress liner | Xiangdong Chen, Thomas W. Dyer, Geng Wang, Haining Yang | 2011-01-04 |
| 7750410 | Structure and method to improve channel mobility by gate electrode stress modification | Dureseti Chidambarrao, Omer H. Dokumaci, Bruce B. Doris, Oleg Gluschenkov | 2010-07-06 |
| 7741166 | Oxidation method for altering a film structure | Diane C. Boyd, Bruce B. Doris, Oleg Gluschenkov | 2010-06-22 |
| 7691701 | Method of forming gate stack and structure thereof | Siddarth A. Krishnan, Unoh Kwon, Naim Moumen, Ravikumar Ramachandran, James K. Schaeffer +3 more | 2010-04-06 |
| 7659160 | Field effect transistors (FETS) with inverted source/drain metallic contacts, and method of fabrication same | Dureseti Chidambarrao, Lawrence A. Clevenger, Kaushik A. Kumar, Carl Radens | 2010-02-09 |
| 7648871 | Field effect transistors (FETS) with inverted source/drain metallic contacts, and method of fabricating same | Dureseti Chidambarrao, Lawrence A. Clevenger, Kaushik A. Kumar, Carl Radens | 2010-01-19 |
| 7618853 | Field effect transistors with dielectric source drain halo regions and reduced miller capacitance | Dureseti Chidambarrao, Oleg Gluschenkov | 2009-11-17 |
| 7585704 | Method of producing highly strained PECVD silicon nitride thin films at low temperature | Oleg Gluschenkov, Ying Li, Anupama Mallikarjunan | 2009-09-08 |
| 7569848 | Mobility enhanced CMOS devices | Bruce B. Doris, Oleg Gluschenkov | 2009-08-04 |
| 7488658 | Stressed semiconductor device structures having granular semiconductor material | Bruce B. Doris, Diane C. Boyd, Dureseti Chidambarrao, Oleg Gluschenkov | 2009-02-10 |
| 7342266 | Field effect transistors with dielectric source drain halo regions and reduced miller capacitance | Dureseti Chidambarrao, Oleg Gluschenkov | 2008-03-11 |
| 7273638 | High density plasma oxidation | Oleg Glushenkov, Andreas Knorr | 2007-09-25 |
| 7271049 | Method of forming self-aligned low-k gate cap | Oleg Gluschenkov, Jack A. Mandelman, Bruce B. Doris | 2007-09-18 |
| 7230296 | Self-aligned low-k gate cap | Oleg Gluschenkov, Jack A. Mandelman, Bruce B. Doris | 2007-06-12 |
| 7205206 | Method of fabricating mobility enhanced CMOS devices | Bruce B. Doris, Oleg Gluschenkov | 2007-04-17 |
| 7202516 | CMOS transistor structure including film having reduced stress by exposure to atomic oxygen | Diane C. Boyd, Bruce B. Doris, Oleg Gluschenkov | 2007-04-10 |
| 7122849 | Stressed semiconductor device structures having granular semiconductor material | Bruce B. Doris, Diane C. Boyd, Dureseti Chidambarrao, Oleg Gluschenkov | 2006-10-17 |
| 7081393 | Reduced dielectric constant spacer materials integration for high speed logic gates | Joyce C. Liu, Hsing-Jen Wann, Richard S. Wise, Hongwen Yan | 2006-07-25 |