Issued Patents All Time
Showing 26–50 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8829518 | Test structure and calibration method | Jeffrey C. Maling, Anthony K. Stamper | 2014-09-09 |
| 8734665 | Slurry for chemical-mechanical polishing of copper and use thereof | Graham M. Bates, Michael T. Brigham, Joseph K. V. Comeau, Jason P. Ritter, Eva A. Shah +1 more | 2014-05-27 |
| 8710661 | Methods for selective reverse mask planarization and interconnect structures formed thereby | Zhong-Xiang He, Anthony K. Stamper | 2014-04-29 |
| 8636917 | Solution for forming polishing slurry, polishing slurry and related methods | Joseph K. V. Comeau, Marina M. Katsnelson, Matthew T. Tiersch | 2014-01-28 |
| 8518817 | Method of electrolytic plating and semiconductor device fabrication | Felix P. Anderson, Zhong-Xiang He, Anthony K. Stamper | 2013-08-27 |
| 8328892 | Solution for forming polishing slurry, polishing slurry and related methods | Joseph K. V. Comeau, Marina M. Katsnelson, Matthew T. Tiersch | 2012-12-11 |
| 8236580 | Copper contamination detection method and system for monitoring copper contamination | Jay Burnham, Joseph K. V. Comeau, Leslie Peter Crane, James R. Elliott, Scott A. Estes +1 more | 2012-08-07 |
| 8210904 | Slurryless mechanical planarization for substrate reclamation | Graham M. Bates, David Domina, James L. Hardy | 2012-07-03 |
| 8129844 | Method of forming a metal silicide layer, devices incorporating metal silicide layers and design structures for the devices | Felix P. Anderson, Zhong-Xiang He, Thomas L. McDevitt | 2012-03-06 |
| 8093679 | Integrated BEOL thin film resistor | Anil K. Chinthakindi, Douglas D. Coolbaugh, John M. Cotte, Ebenezer E. Eshun, Zhong-Xiang He +1 more | 2012-01-10 |
| 8088690 | CMP method | Thomas L. McDevitt, Graham M. Bates, Eva A. Shah, Matthew T. Tiersch | 2012-01-03 |
| 7957917 | Copper contamination detection method and system for monitoring copper contamination | Jay Burnham, Joseph K. V. Comeau, Leslie Peter Crane, James R. Elliott, Scott A. Estes +1 more | 2011-06-07 |
| 7902629 | Integrated BEOL thin film resistor | Anil K. Chinthakindi, Douglas D. Coolbaugh, John M. Cotte, Ebenezer E. Eshun, Zhong-Xiang He +1 more | 2011-03-08 |
| 7888142 | Copper contamination detection method and system for monitoring copper contamination | Jay Burnham, Joseph K. V. Comeau, Leslie Peter Crane, James R. Elliott, Scott A. Estes +1 more | 2011-02-15 |
| 7851353 | Method of forming a metal silicide layer, devices incorporating metal silicide layers and design structures for the devices | Felix P. Anderson, Zhong-Xiang He, Thomas Leddy McDevin | 2010-12-14 |
| 7824568 | Solution for forming polishing slurry, polishing slurry and related methods | Joseph K. V. Comeau, Marina M. Katsnelson, Matthew T. Tiersch | 2010-11-02 |
| 7485540 | Integrated BEOL thin film resistor | Anil K. Chinthakindi, Douglas D. Coolbaugh, John M. Cotte, Ebenezer E. Eshun, Zhong-Xiang He +1 more | 2009-02-03 |
| 7245025 | Low cost bonding pad and method of fabricating same | Jeffrey A. Brigante, Zhong-Xiang He, Barbara Waterhouse | 2007-07-17 |
| 7223697 | Chemical mechanical polishing method | Garth A. Brooks, Bruce W. Porth, Steven M. Shank | 2007-05-29 |
| 6822472 | Detection of hard mask remaining on a surface of an insulating layer | Sanjit Das, Anthony K. Stamper | 2004-11-23 |
| 6818992 | Self-aligned copper silicide formation for improved adhesion/electromigration | Douglas S. Armbrust, Margaret L. Gibson, Laura Serianni | 2004-11-16 |
| 6812193 | Slurry for mechanical polishing (CMP) of metals and use thereof | Michael T. Brigham, Donald F. Canaperi, Michael A. Cobb, William J. Cote, Kenneth M. Davis +9 more | 2004-11-02 |
| 6394638 | Trench isolation for active areas and first level conductors | Edward W. Sengle, Mark D. Jaffe, Daniel N. Maynard, Mark A. Lavin, John A. Bracchitta | 2002-05-28 |
| 6355565 | Chemical-mechanical-polishing slurry and method for polishing metal/oxide layers | Paul M. Feeney, Timothy C. Krywanczyk, Lawrence D. David, Matthew T. Tiersch | 2002-03-12 |
| 6348076 | Slurry for mechanical polishing (CMP) of metals and use thereof | Donald F. Canaperi, William J. Cote, Paul M. Feeney, Mahadevaiyer Krishnan, Joyce C. Liu +2 more | 2002-02-19 |