Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
CY

Chih-Chao Yang — 888 Patents

IBM: 837 patents #5 of 70,183Top 1%
Globalfoundries: 21 patents #139 of 4,424Top 4%
ITITRI: 11 patents #451 of 9,619Top 5%
Infineon Technologies Ag: 8 patents #1,246 of 7,486Top 20%
TETessera: 7 patents #62 of 271Top 25%
UMUnited Microelectronics: 3 patents #1,523 of 4,560Top 35%
NLNational Applied Research Laboratories: 3 patents #58 of 506Top 15%
ETElpis Technologies: 2 patents #16 of 121Top 15%
NMNovatek Microelectronics: 1 patents #575 of 986Top 60%
CUClemson University: 1 patents #68 of 317Top 25%
GUGlobalfoundries U.S.: 1 patents #22 of 211Top 15%
Glenmont, NY: #1 of 67 inventorsTop 2%
New York: #4 of 115,490 inventorsTop 1%
Overall (All Time): #82 of 4,157,543Top 1%
888 Patents All Time

Issued Patents All Time

Showing 601–625 of 888 patents

Patent #TitleCo-InventorsDate
8815734 Use of gas cluster ion beam to reduce metal void formation in interconnect structures Kangguo Cheng, Junli Wang, Keith Kwong Hon Wong 2014-08-26
8809174 MOSFET gate and source/drain contact metallization Soon-Cheon Seo, Bruce B. Doris 2014-08-19
8802558 Copper interconnect structures and methods of making same Marc A. Bergendahl, David V. Horak, Baozhen Li, Shom Ponoth 2014-08-12
8802563 Surface repair structure and process for interconnect applications Conal E. Murray 2014-08-12
8803321 Dual damascene dual alignment interconnect scheme Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Shom Ponoth 2014-08-12
8802559 Interconnect structure with an electromigration and stress migration enhancement liner Baozhen Li 2014-08-12
8796853 Metallic capped interconnect structure with high electromigration resistance and low resistivity Chao-Kun Hu 2014-08-05
8796783 Borderless contact structure employing dual etch stop layers Su Chen Fan, David V. Horak, Charles W. Koburger, III, Shom Ponoth 2014-08-05
8796854 Hybrid interconnect structure for performance improvement and reliability enhancement Thomas M. Shaw, Keith Kwong Hon Wong, Haining Yang 2014-08-05
8790989 Modularized three-dimensional capacitor array Louis L. Hsu, Xu Ouyang 2014-07-29
8785320 Structure and process for metallization in high aspect ratio features Fenton R. McFeely 2014-07-22
8785284 FinFETs and fin isolation structures Marc A. Bergendahl, David V. Horak, Charles W. Koburger, III, Shom Ponoth 2014-07-22
8779491 3D via capacitor with a floating conductive plate for improved reliability Fen Chen, Baozhen Li 2014-07-15
8772156 Methods of fabricating interconnect structures containing various capping materials for electrical fuse and other related applications Louis L. Hsu, William R. Tonti 2014-07-08
8765590 Insulative cap for borderless self-aligning contact in semiconductor device Kangguo Cheng, Junli Wang, Keith Kwong Hon Wong 2014-07-01
8766360 Insulative cap for borderless self-aligning contact in semiconductor device Kangguo Cheng, Junli Wang, Keith Kwong Hon Wong 2014-07-01
8765585 Method of forming a borderless contact structure employing dual etch stop layers Su Chen Fan, David V. Horak, Charles W. Koburger, III, Shom Ponoth 2014-07-01
8754526 Hybrid interconnect structure for performance improvement and reliability enhancement Thomas M. Shaw, Keith Kwong Hon Wong, Haining Yang 2014-06-17
8753927 Low cost anti-fuse structure and method to make same Stephen M. Gates 2014-06-17
8753979 Hybrid interconnect structure for performance improvement and reliability enhancement Thomas M. Shaw, Keith Kwong Hon Wong, Haining Yang 2014-06-17
8754483 Low-profile local interconnect and method of making the same Shom Ponoth, David V. Horak, Charles W. Koburger, III 2014-06-17
8754520 Formation of air gap with protection of metal lines Takeshi Nogami, Shyng-Tsong Chen, David V. Horak, Son V. Nguyen, Shom Ponoth 2014-06-17
8742581 Enhanced diffusion barrier for interconnect structures Daniel C. Edelstein, Steven E. Molis 2014-06-03
8735279 Air-dielectric for subtractive etch line and via metallization David V. Horak, Elbert E. Huang, Charles W. Koburger, III, Shom Ponoth 2014-05-27
8716101 Structure and method of reducing electromigration cracking and extrusion effects in semiconductor devices Kaushik Chandra, Ronald G. Filippi, Wai-Kin Li, Ping-Chuan Wang 2014-05-06