Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12040373 | Liner-free resistance contacts and silicide with silicide stop layer | Nicolas Loubet, Christian Lavoie, Nicholas Anthony Lanzillo | 2024-07-16 |
| 11894423 | Contact resistance reduction in nanosheet device structure | Heng Wu, Dechao Guo, Ruqiang Bao, Junli Wang, Lan Yu +1 more | 2024-02-06 |
| 11800817 | Phase change memory cell galvanic corrosion prevention | Injo Ok, Nicole Saulnier, Kevin W. Brew, Steven Michael McDermott, Lawrence A. Clevenger +2 more | 2023-10-24 |
| 11289573 | Contact resistance reduction in nanosheet device structure | Heng Wu, Dechao Guo, Ruqiang Bao, Junli Wang, Lan Yu +1 more | 2022-03-29 |
| 11205590 | Self-aligned contacts for MOL | Su Chen Fan, Ruilong Xie, Kangguo Cheng | 2021-12-21 |
| 11024536 | Contact interlayer dielectric replacement with improved SAC cap retention | Vimal Kamineni, Ruilong Xie, Andrew M. Greene, Nigel G. Cave, Veeraraghavan S. Basker | 2021-06-01 |
| 10978573 | Spacer-confined epitaxial growth | Karthik Yogendra, Ardasheir Rahman, Robert R. Robison | 2021-04-13 |
| 10916470 | Modified dielectric fill between the contacts of field-effect transistors | Vimal Kamineni, Ruilong Xie, Kangguo Cheng | 2021-02-09 |
| 10896965 | Formation of wrap-around-contact to reduce contact resistivity | Jingyun Zhang, Choonghyun Lee, Takashi Ando, Pouya Hashemi | 2021-01-19 |
| 10886376 | Formation of wrap-around-contact to reduce contact resistivity | Jingyun Zhang, Choonghyun Lee, Takashi Ando, Pouya Hashemi | 2021-01-05 |
| 10770562 | Interlayer dielectric replacement techniques with protection for source/drain contacts | Kangguo Cheng, Juntao Li, Andrew M. Greene, Vimal Kamineni, Chanro Park +1 more | 2020-09-08 |
| 10734575 | ReRAM structure formed by a single process | Alexander Reznicek, Oscar van der Straten, Praneet Adusumilli | 2020-08-04 |
| 10586872 | Formation of wrap-around-contact to reduce contact resistivity | Jingyun Zhang, Choonghyun Lee, Takashi Ando, Pouya Hashemi | 2020-03-10 |
| 10446746 | ReRAM structure formed by a single process | Alexander Reznicek, Oscar van der Straten, Praneet Adusumilli | 2019-10-15 |
| 10395925 | Patterning material film stack comprising hard mask layer having high metal content interface to resist layer | Ekmini Anuja De Silva, Shanti Pancharatnam, Indira Seshadri, Yasir Sulehria | 2019-08-27 |
| 10367077 | Wrap around contact using sacrificial mandrel | Nicolas Loubet, Kangguo Cheng | 2019-07-30 |
| 10361277 | Low resistivity wrap-around contacts | Praneet Adusumilli, Alexander Reznicek, Oscar van der Straten | 2019-07-23 |
| 10276442 | Wrap-around contacts formed with multiple silicide layers | Ruilong Xie, Julien Frougier, Kangguo Cheng, Nicolas Loubet | 2019-04-30 |
| 10074727 | Low resistivity wrap-around contacts | Praneet Adusumilli, Alexander Reznicek, Oscar van der Straten | 2018-09-11 |
| 9831254 | Multiple breakdown point low resistance anti-fuse structure | Praneet Adusumilli, Alexander Reznicek, Oscar van der Straten | 2017-11-28 |