Issued Patents All Time
Showing 26–50 of 365 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9159653 | Copper interconnect structures and methods of making same | Chih-Chao Yang, Marc A. Bergendahl, Baozhen Li, Shom Ponoth | 2015-10-13 |
| 9147576 | Gate contact with vertical isolation from source-drain | Shom Ponoth, Balasubramanian Pranatharthiharan, Ruilong Xie | 2015-09-29 |
| 9141749 | Interconnect structures and methods for back end of the line integration | Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2015-09-22 |
| 9130029 | Recessing and capping of gate structures with varying metal compositions | Ruilong Xie, Su Chen Fan, Pranatharthiharan Haran Balasubramanian | 2015-09-08 |
| 9105693 | Microelectronic structure including air gap | Daniel C. Edelstein, Elbert E. Huang, Satyanarayana V. Nitta, Takeshi Nogami, Shom Ponoth +1 more | 2015-08-11 |
| 9105641 | Profile control in interconnect structures | Shyng-Tsong Chen, Samuel S. Choi, Steven J. Holmes, Charles W. Koburger, III, Wai-Kin Li +4 more | 2015-08-11 |
| 9064801 | Bi-layer gate cap for self-aligned contact formation | Jin-Wook Lee, Daniel T. Pham, Shom Ponoth, Balasubramanian Pranatharthiharan | 2015-06-23 |
| 9059270 | Replacement gate MOSFET with raised source and drain | Shom Ponoth, Chih-Chao Yang | 2015-06-16 |
| 9059254 | Overlay-tolerant via mask and reactive ion etch (RIE) technique | Steven J. Holmes, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2015-06-16 |
| 9059251 | Microelectronic structure including air gap | Daniel C. Edelstein, Elbert E. Huang, Satyanarayana V. Nitta, Takeshi Nogami, Shom Ponoth +1 more | 2015-06-16 |
| 9054156 | Non-lithographic hole pattern formation | Chiahsun Tseng, Chun-Chen Yeh, Yunpeng Yin | 2015-06-09 |
| 9048217 | Middle of-line borderless contact structure and method of forming | Brent A. Anderson, Edward J. Nowak | 2015-06-02 |
| 9024389 | Borderless contact for ultra-thin body devices | Su Chen Fan, Balasubramanian S. Haran | 2015-05-05 |
| 8969213 | Non-lithographic line pattern formation | Chiahsun Tseng, Chun-Chen Yeh, Yunpeng Yin | 2015-03-03 |
| 8957465 | Formation of the dielectric cap layer for a replacement gate structure | Ruilong Xie, Balasubramanian S. Pranatharthi Haran, Su Chen Fan | 2015-02-17 |
| 8946908 | Dual-metal self-aligned wires and vias | Steven J. Holmes, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2015-02-03 |
| 8946866 | Microelectronic substrate having removable edge extension element | Charles W. Koburger, III, Steven J. Holmes, Kurt R. Kimmel, Karen E. Petrillo, Christopher F. Robinson | 2015-02-03 |
| 8946006 | Replacement gate MOSFET with raised source and drain | Shom Ponoth, Chih-Chao Yang | 2015-02-03 |
| 8941156 | Self-aligned dielectric isolation for FinFET devices | Marc A. Bergendahl, Kangguo Cheng, Ali Khakifirooz, Shom Ponoth, Theodorus E. Standaert +4 more | 2015-01-27 |
| 8941179 | Finfets and fin isolation structures | Marc A. Bergendahl, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2015-01-27 |
| 8937359 | Contact formation for ultra-scaled devices | Ruilong Xie, Shom Ponoth, Balasubramanian Pranatharthiharan | 2015-01-20 |
| 8916337 | Dual hard mask lithography process | John C. Arnold, Sean D. Burns, Steven J. Holmes, Muthumanickam Sankarapandian, Yunpeng Yin | 2014-12-23 |
| 8912059 | Middle of-line borderless contact structure and method of forming | Brent A. Anderson, Edward J. Nowak | 2014-12-16 |
| 8912627 | Electrical fuse structure and method of fabricating same | Chih-Chao Yang, Charles W. Koburger, III, Shom Ponoth | 2014-12-16 |
| 8906793 | Borderless contact for an aluminum-containing gate | Sivananda K. Kanakasabapathy, Hemanth Jagannathan | 2014-12-09 |