Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6706422 | Electroless Ni—B plating liquid, electronic device and method for manufacturing the same | Hiroaki Inoue, Kenji Nakamura, Moriji Matsumoto, Hirokazu Ezawa, Masahiro Miyata | 2004-03-16 |
| 6632335 | Plating apparatus | Junji Kunisawa, Mitsuko Odagaki, Natsuki Makino, Koji Mishima, Kenji Nakamura +7 more | 2003-10-14 |
| 6626736 | Polishing apparatus | Norio Kimura | 2003-09-30 |
| 6547638 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa | 2003-04-15 |
| 6500051 | Polishing apparatus and method | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Hiromi Yajima, Kazuaki Himukai +7 more | 2002-12-31 |
| 6443808 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa | 2002-09-03 |
| 6439971 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa | 2002-08-27 |
| 6435949 | Workpiece polishing apparatus comprising a fluid pressure bag provided between a pressing surface and the workpiece and method of use thereof | Seiji Katsuoka, Hozumi Yasuda, Tadakazu Sone, Shunichiro Kojima | 2002-08-20 |
| 6425806 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa | 2002-07-30 |
| 6413146 | Polishing apparatus | Seiji Katsuoka, Kunihiko Sakurai, Hiroyuki Osawa | 2002-07-02 |
| 6406364 | Polishing solution feeder | Norio Kimura, Hirokuni Hiyama, Yutaka Wada, Kiyotaka Kawashima, Takayoshi Kawamoto | 2002-06-18 |
| 6332826 | Polishing apparatus | Seiji Katsuoka, Kunihiko Sakurai, Hiroyuki Osawa | 2001-12-25 |
| 6294059 | Substrate plating apparatus | Akihisa Hongo, Naoaki Ogure, Hiroaki Inoue, Norio Kimura, Fumio Kuriyama +2 more | 2001-09-25 |
| 6273802 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa | 2001-08-14 |
| RE36610 | Evacuation apparatus and evacuation method | Katsuya Okumura, Fumio Kuriyama, Yukio Murai, Hiroshi Sobukawa | 2000-03-14 |
| 5885138 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa | 1999-03-23 |
| 5868866 | Method of and apparatus for cleaning workpiece | Toshiro Maekawa, Koji Ono | 1999-02-09 |
| 5792326 | Method and apparatus for generating ozone and methods of its use | Minoru Harada, Ryoichi Shinjo, Rempei Nakata, Kunihiro Miyazaki, Naruhiko Kaji +1 more | 1998-08-11 |
| 5794114 | Ozonizer | Minoru Harada, Ryoichi Shinjo, Rempei Nakata, Kunihiro Miyazaki, Naruhiko Kaji | 1998-08-11 |
| 5746581 | Method and apparatus for evacuating vacuum system | Katsuya Okumura, Yuuichi Mikata, Yoshio Ando | 1998-05-05 |
| 5704827 | Polishing apparatus including cloth cartridge connected to turntable | Toyomi Nishi, Tamami Takahashi, Hiromi Yajima, Riichiro Aoki, Yukio Imoto +4 more | 1998-01-06 |
| 5705230 | Method for filling small holes or covering small recesses in the surface of substrates | Toru Matanabe, Hirokazu Ezawa, Masahiro Miyata, Yukio Ikeda, Hiroaki Inoue +2 more | 1998-01-06 |
| 5702673 | Ozone generating apparatus | Naruhiko Kaji, Yutaka Nakano, Rempei Nakata, Minoru Harada, Ryoichi Shinjo | 1997-12-30 |
| 5679059 | Polishing aparatus and method | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Hiromi Yajima, Kazuaki Himukai +7 more | 1997-10-21 |
| 5656542 | Method for manufacturing wiring in groove | Masahiro Miyata, Hirokazu Ezawa, Naoaki Ogure, Takeyuki Ohdaira, Hiroaki Inoue +1 more | 1997-08-12 |