IF

Igor V. Fomenkov

CY Cymer: 123 patents #2 of 339Top 1%
AB Asml Netherlands B.V.: 39 patents #79 of 3,192Top 3%
CT Cymer Laser Technologies: 1 patents #6 of 9Top 70%
Overall (All Time): #5,137 of 4,157,543Top 1%
164
Patents All Time

Issued Patents All Time

Showing 25 most recent of 164 patents

Patent #TitleCo-InventorsDate
12389519 Guiding device and associated system Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodrigues Nunes, Alexander I. Ershov, Kornelis Frits Feenstra +13 more 2025-08-12
12369244 Laser system for source material conditioning in an EUV light source Yezheng Tao, Robert Jay Rafac 2025-07-22
12287455 Oxygen-loss resistant top coating for optical elements Yue Ma, Marcus Adrianus Van De Kerkhof, Qiushi Zhu, Klaus Hummler, Peter Matthew Mayer +3 more 2025-04-29
12171053 System for monitoring a plasma Michael A. Purvis, Klaus Hummler, Chengyuan Ding, Robert Jay Rafac 2024-12-17
12078934 Laser system for target metrology and alteration in an EUV light source Robert Jay Rafac 2024-09-03
11846887 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more 2023-12-19
11822252 Guiding device and associated system Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodreigues Nunes, Alexander I. Ershov, Kornelis Frits Feenstra +13 more 2023-11-21
11340532 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more 2022-05-24
11266002 System for monitoring a plasma Michael A. Purvis, Klaus Hummler, Chengyuan Ding, Robert Jay Rafac 2022-03-01
10966308 EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods William N. Partlo, Richard L. Sandstrom, Daniel John William Brown 2021-03-30
10955749 Guiding device and associated system Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodriges Nunes, Alexander I. Ershov, Kornelis Frits Feenstra +13 more 2021-03-23
10663866 Wavelength-based optical filtering Alexander Anthony Schafgans, Yezheng Tao, Rostislav Rokitski, Robert Jay Rafac, Daniel John William Brown +1 more 2020-05-26
10635002 Faceted EUV optical element David C. Brandt, Alexander I. Ershov 2020-04-28
10490313 Method of controlling debris in an EUV light source Alexander I. Ershov, John Tom Stewart, IV, Christianus W. J. Berendsen 2019-11-26
10128017 Apparatus for and method of controlling debris in an EUV light source Alexander I. Ershov, John Tom Stewart, IV, Christianus W. J. Berendsen 2018-11-13
9832852 EUV LPP source with dose control and laser stabilization using variable width laser pulses Robert Jay Rafac 2017-11-28
9735535 Drive laser for EUV light source Alexander I. Ershov, Jerzy Hoffman, Norbert Bowering 2017-08-15
9713239 Laser produced plasma EUV light source Bjorn Hansson, Alexander N. Bykanov, David C. Brandt 2017-07-18
9669334 Material supply apparatus for extreme ultraviolet light source having a filter constructed with a plurality of openings fluidly coupled to a plurality of through holes to remove non-target particles from the supply material William N. Partlo, Gregory O. Vaschenko, William Oldham 2017-06-06
9541840 Faceted EUV optical element David C. Brandt, Alexander I. Ershov 2017-01-10
9516730 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source Vladimir B. Fleurov, William N. Partlo, Alexander I. Ershov 2016-12-06
9462668 Target for extreme ultraviolet light source Yezheng Tao, Robert Jay Rafac, Daniel John William Brown, Daniel J. Golich 2016-10-04
9390827 EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods William N. Partlo, Richard L. Sandstrom, Daniel John William Brown 2016-07-12
9167679 Beam position control for an extreme ultraviolet light source Vladimir B. Fleurov 2015-10-20
9155179 Target for extreme ultraviolet light source Yezheng Tao, Robert Jay Rafac, Daniel John William Brown, Daniel J. Golich 2015-10-06