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Fluid handling system, method and lithographic apparatus |
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Guiding device and associated system |
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| 12287580 |
Fluid handling system, method and lithographic apparatus |
Cornelius Maria Rops, Erik Henricus Egidius Catharina Eummelen, Dagmar Antoinette Wismeijer |
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| 11822252 |
Guiding device and associated system |
Dzmitry Labetski, Rui Miguel Duarte Rodreigues Nunes, Alexander I. Ershov, Kornelis Frits Feenstra, Igor V. Fomenkov +13 more |
2023-11-21 |
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Process tool and an inspection method |
Raphael Nico Johan Stegen, Erik Henricus Egidius Catharina Eummelen, Theodorus Wilhelmus Polet, Giovanni Luca Gattobigio |
2023-08-08 |
| RE49142 |
Lithographic apparatus and an object positioning system |
Adrianus Hendrik Koevoets, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra SAPUTRA +4 more |
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| 10955749 |
Guiding device and associated system |
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| 10948825 |
Method for removing photosensitive material on a substrate |
Güneş Nakibo{hacek over (g)}lu, Daan Daniel Johannes Antonius Van Sommeren, Gijsbert Rispens, Johan Franciscus Maria Beckers, Theodorus Johannes Antonius Renckens |
2021-03-16 |
| 10216095 |
Immersion lithographic apparatus |
Michel Riepen, Anton Alexander Darhuber, Hubertus Mattheus Joseph Maria Wedershoven, Josephus Catharina Henricus Zeegers |
2019-02-26 |
| 10018926 |
Lithographic apparatus and method of manufacturing a lithographic apparatus |
Rogier Hendrikus Magdalena Cortie, Andre Bernardus Jeunink, Adrianus Hendrik Koevoets, Jim Vincent Overkamp, Siegfried Alexander Tromp +2 more |
2018-07-10 |
| 9983489 |
Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation |
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2018-05-29 |
| 9939738 |
Lithographic apparatus and an object positioning system |
Adrianus Hendrik Koevoets, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra SAPUTRA +4 more |
2018-04-10 |