Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10685807 | Creating ion energy distribution functions (IEDF) | Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2020-06-16 |
| 10553404 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Sunil Srinivasan, Rajinder Dhindsa, James Rogers, Denis M. Koosau | 2020-02-04 |
| 10555412 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Olivier Luere, Rajinder Dhindsa, James Rogers, Sunil Srinivasan, Anurag Kumar Mishra | 2020-02-04 |
| 10504702 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Rajinder Dhindsa, Sunil Srinivasan, Denis M. Koosau, James Rogers | 2019-12-10 |
| 10475626 | Ion-ion plasma atomic layer etch process and reactor | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Yang Yang | 2019-11-12 |
| 10448494 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Olivier Luere, Rajinder Dhindsa, James Rogers, Sunil Srinivasan, Anurag Kumar Mishra | 2019-10-15 |
| 10448495 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Olivier Luere, Rajinder Dhindsa, James Rogers, Sunil Srinivasan, Anurag Kumar Mishra | 2019-10-15 |
| 10373804 | System for tunable workpiece biasing in a plasma reactor | Travis Koh, Philip Allan Kraus, Prabu Gopalraja | 2019-08-06 |
| 10312048 | Creating ion energy distribution functions (IEDF) | Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2019-06-04 |
| 10131994 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-11-20 |
| 10103010 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Rajinder Dhindsa, Sunil Srinivasan, Denis M. Koosau, James Rogers | 2018-10-16 |
| 9947517 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Rajinder Dhindsa, Sunil Srinivasan, Denis M. Koosau, James Rogers | 2018-04-17 |
| 9896769 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-02-20 |
| 9824862 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2017-11-21 |
| 9799491 | Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching | Kenneth S. Collins, Shahid Rauf, Kartik Ramaswamy, James D. Carducci, Hamid Tavassoli +2 more | 2017-10-24 |
| 9745663 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2017-08-29 |
| 9721760 | Electron beam plasma source with reduced metal contamination | Shahid Rauf, Kenneth S. Collins, Kartik Ramaswamy, Nipun Misra, Gonzalo Monroy +2 more | 2017-08-01 |
| 9564297 | Electron beam plasma source with remote radical source | Ming-Feng Wu, Shahid Rauf, Ying Zhang, Kenneth S. Collins, Hamid Tavassoli +2 more | 2017-02-07 |
| 9443700 | Electron beam plasma source with segmented suppression electrode for uniform plasma generation | Shahid Rauf, Kenneth S. Collins, Nipun Misra, Kartik Ramaswamy, James D. Carducci +1 more | 2016-09-13 |
| 9378941 | Interface treatment of semiconductor surfaces with high density low energy plasma | Aneesh Nainani, Bhushan Zope, Shahid Rauf, Adam Brand, Mathew Abraham +1 more | 2016-06-28 |
| 9269546 | Plasma reactor with electron beam plasma source having a uniform magnetic field | Ming-Feng Wu, Ajit Balakrishna, Shahid Rauf, Kenneth S. Collins, Nipun Misra | 2016-02-23 |
| 9177824 | Photoresist treatment method by low bombardment plasma | Banqiu Wu, Ajay Kumar, Shahid Rauf, Kartik Ramaswamy, Omkaram Nalamasu | 2015-11-03 |
| 9129777 | Electron beam plasma source with arrayed plasma sources for uniform plasma generation | Shahid Rauf, Kenneth S. Collins, Nipun Misra, James D. Carducci, Gary Leray +1 more | 2015-09-08 |
| 9111722 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Shahid Rauf, Jonathan Liu, Jason A. Kenney, Andrew Nguyen, Kenneth S. Collins +2 more | 2015-08-18 |
| 9082591 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Shahid Rauf, Jonathan Liu, Jason A. Kenney, Andrew Nguyen, Kenneth S. Collins +2 more | 2015-07-14 |