Issued Patents All Time
Showing 26–50 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500356 | Selectively etching silicon using fluorine without plasma | Haruhiro Harry Goto, William Harshbarger | 2002-12-31 |
| 6468601 | Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology | Quanyuan Shang, Robert Robertson, Dan Maydan | 2002-10-22 |
| 6451390 | Deposition of TEOS oxide using pulsed RF plasma | Haruhiro Harry Goto, Takako Takehara, Carl A. Sorensen, William Harshbarger | 2002-09-17 |
| 6444277 | Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates | Robert Robertson, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan | 2002-09-03 |
| 6355108 | Film deposition using a finger type shadow frame | Tae Kyung Won, Quanyuan Shang, Robert Robertson, Soo Young Choi, Robert I. Greene +1 more | 2002-03-12 |
| 6352910 | Method of depositing amorphous silicon based films having controlled conductivity | William Harshbarger, Takako Takehara, Jeff Olsen, Regina Qiu, Yvonne LeGrice +2 more | 2002-03-05 |
| 6338874 | Method for multilayer CVD processing in a single chamber | Robert Robertson, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan | 2002-01-15 |
| 6235634 | Modular substrate processing system | John M. White, Robert B. Conner, Jr., Norman L. Turner, William T. Lee, Shinichi Kurita | 2001-05-22 |
| 6207304 | Method of forming silicon oxy-nitride films by plasma-enhanced chemical vapor deposition | Jeff Olsen | 2001-03-27 |
| 6182603 | Surface-treated shower head for use in a substrate processing chamber | Quanyuan Shang, Sheng Sun, Emanuel Beer | 2001-02-06 |
| 6177023 | Method and apparatus for electrostatically maintaining substrate flatness | Quanyuan Shang, Robert Robertson, James T. Gardner | 2001-01-23 |
| 6172322 | Annealing an amorphous film using microwave energy | Quanyuan Shang, Robert Robertson, Takako Takehara, Taekyung Won, Sheng Sun | 2001-01-09 |
| 6167834 | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 2001-01-02 |
| 6055927 | Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology | Quanyuan Shang, Robert Robertson, Dan Maydan | 2000-05-02 |
| RE36623 | Process for PECVD of silicon oxide using TEOS decomposition | David N. Wang, John M. White, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 2000-03-21 |
| 6024044 | Dual frequency excitation of plasma for film deposition | Robert Robertson, Quanyuan Shang, Jeff Olsen, Carl A. Sorensen | 2000-02-15 |
| 5928732 | Method of forming silicon oxy-nitride films by plasma-enhanced chemical vapor deposition | Jeff Olsen | 1999-07-27 |
| 5902650 | Method of depositing amorphous silicon based films having controlled conductivity | Jeff Feng, Robert Robertson | 1999-05-11 |
| 5895548 | High power microwave plasma applicator | Gary C. Ettinger, Quanyuan Shang | 1999-04-20 |
| 5895937 | Tapered dielectric etch in semiconductor devices | Yuh-Jia Su, Yuen-Kui Wong, Haruhiro (Harry) Goto | 1999-04-20 |
| 5893757 | Tapered profile etching method | Yuh-Jia Su, Yuen-Kui Wong | 1999-04-13 |
| 5892328 | High-power, plasma-based, reactive species generator | Quanyuan Shang, Dan Maydan | 1999-04-06 |
| 5871811 | Method for protecting against deposition on a selected region of a substrate | David N. Wang, John M. White, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 1999-02-16 |
| 5861197 | Deposition of high quality conformal silicon oxide thin films on glass substrates | Robert Robertson, Guofu J. Feng | 1999-01-19 |
| 5851602 | Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors | Robert Robertson, Jeffrey Feng | 1998-12-22 |