Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9941108 | High dose implantation strip (HDIS) in H2 base chemistry | David Cheung | 2018-04-10 |
| 9373497 | Methods for stripping photoresist and/or cleaning metal regions | David Chen, Martina Su, Frank Greer, Shamsuddin Alokozai | 2016-06-21 |
| 8641862 | High dose implantation strip (HDIS) in H2 base chemistry | David Cheung | 2014-02-04 |
| 8444869 | Simultaneous front side ash and backside clean | David Cheung | 2013-05-21 |
| 8435895 | Methods for stripping photoresist and/or cleaning metal regions | David Chen, Martina Martina, Frank Greer, Shamsuddin Alokozai | 2013-05-07 |
| 8193096 | High dose implantation strip (HDIS) in H2 base chemistry | David Cheung | 2012-06-05 |
| 8058178 | Photoresist strip method for low-k dielectrics | Ilia Kalinovski, Khalid Mohamed | 2011-11-15 |
| 7740768 | Simultaneous front side ash and backside clean | David Cheung | 2010-06-22 |
| 7585777 | Photoresist strip method for low-k dielectrics | Ilia Kalinovski, Khalid Mohamed | 2009-09-08 |
| 7288484 | Photoresist strip method for low-k dielectrics | Ilia Kalinovski, Khalid Mohamed | 2007-10-30 |
| 7202176 | Enhanced stripping of low-k films using downstream gas mixing | David Cheung, Prabhat Kumar Sinha | 2007-04-10 |
| 7105100 | System and method for gas distribution in a dry etch process | — | 2006-09-12 |
| 6880561 | Fluorine process for cleaning semiconductor process chamber | William Harshbarger, Quanyuan Shang, Kam S. Law | 2005-04-19 |
| 6500356 | Selectively etching silicon using fluorine without plasma | William Harshbarger, Kam S. Law | 2002-12-31 |
| 6472329 | Etching aluminum over refractory metal with successive plasmas | Kai-An Wang, Jenny Tran | 2002-10-29 |
| 6451390 | Deposition of TEOS oxide using pulsed RF plasma | Takako Takehara, Carl A. Sorensen, William Harshbarger, Kam S. Law | 2002-09-17 |
| 5980686 | System and method for gas distribution in a dry etch process | — | 1999-11-09 |
| 5895549 | Method and apparatus for etching film layers on large substrates | Jerry Wong, Junichi Fujimoto | 1999-04-20 |
| 5843277 | Dry-etch of indium and tin oxides with C2H5I gas | Yuh-Jia Su, Yuen-Kui Wong, Kam S. Law | 1998-12-01 |
| 5728278 | Plasma processing apparatus | Nobuyuki Okamura, Atsushi Yamagami, Tadahiro Ohmi, Tadashi Shibata | 1998-03-17 |
| 5607602 | High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas | Yuh-Jia Su, Yuen-Kui Wong, Kam S. Law | 1997-03-04 |
| 5316645 | Plasma processing apparatus | Atsushi Yamagami, Nobuyuki Okamura, Tadahiro Ohmi, Tadashi Shibata | 1994-05-31 |