| 8058181 |
Method for post-etch cleans |
David Chen, Eddie Chiu, Maria Paola Pozzoli, Senzi Li, Giuseppe Colangelo +2 more |
2011-11-15 |
| 7569492 |
Method for post-etch cleans |
David Chen, Eddie Chiu, Maria Paola Pozzoli, Senzi Li, Giuseppe Colangelo +2 more |
2009-08-04 |
| 7390755 |
Methods for post etch cleans |
David Chen, Eddie Chiu, Maria Paola Pozzoli, Senzi Li, Giuseppe Colangelo +2 more |
2008-06-24 |
| 7160813 |
Etch back process approach in dual source plasma reactors |
Cindy W. Chen, Eddie Chiu, Mavis J. Chaboya |
2007-01-09 |
| 6955177 |
Methods for post polysilicon etch photoresist and polymer removal with minimal gate oxide loss |
Eddie Chiu, Cindy W. Chen, Wesley P. Graff |
2005-10-18 |
| 6855225 |
Single-tube interlaced inductively coupling plasma source |
David Chen, Vincent Decaux |
2005-02-15 |
| 6125788 |
Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter |
Graham W. Hills |
2000-10-03 |
| 5996218 |
Method of forming an electrostatic chuck suitable for magnetic flux processing |
Shamouil Shamouilian, John F. Cameron, Chandra Deshpandey |
1999-12-07 |
| 5895937 |
Tapered dielectric etch in semiconductor devices |
Yuen-Kui Wong, Kam S. Law, Haruhiro (Harry) Goto |
1999-04-20 |
| 5893757 |
Tapered profile etching method |
Yuen-Kui Wong, Kam S. Law |
1999-04-13 |
| 5843277 |
Dry-etch of indium and tin oxides with C2H5I gas |
Haruhiro Harry Goto, Yuen-Kui Wong, Kam S. Law |
1998-12-01 |
| 5744049 |
Plasma reactor with enhanced plasma uniformity by gas addition, and method of using same |
Graham W. Hills |
1998-04-28 |
| 5728608 |
Tapered dielectric etch in semiconductor devices |
Yuen-Kui Wong, Kam S. Law, Haruhiro (Harry) Goto |
1998-03-17 |
| 5685914 |
Focus ring for semiconductor wafer processing in a plasma reactor |
Graham W. Hills, Yoshiaki Tanase, Robert E. Ryan |
1997-11-11 |
| 5607602 |
High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas |
Yuen-Kui Wong, Kam S. Law, Haruhiro Harry Goto |
1997-03-04 |
| 5592358 |
Electrostatic chuck for magnetic flux processing |
Shamouil Shamouilian, John F. Cameron, Chandra Deshpandey |
1997-01-07 |
| 5589002 |
Gas distribution plate for semiconductor wafer processing apparatus with means for inhibiting arcing |
— |
1996-12-31 |
| 5528451 |
Erosion resistant electrostatic chuck |
— |
1996-06-18 |
| 5507874 |
Method of cleaning of an electrostatic chuck in plasma reactors |
Richard Muh |
1996-04-16 |
| 5410122 |
Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers |
Anand Gupta, Graham W. Hills, Joseph Lanucha |
1995-04-25 |
