Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058181 | Method for post-etch cleans | David Chen, Eddie Chiu, Maria Paola Pozzoli, Senzi Li, Giuseppe Colangelo +2 more | 2011-11-15 |
| 7569492 | Method for post-etch cleans | David Chen, Eddie Chiu, Maria Paola Pozzoli, Senzi Li, Giuseppe Colangelo +2 more | 2009-08-04 |
| 7390755 | Methods for post etch cleans | David Chen, Eddie Chiu, Maria Paola Pozzoli, Senzi Li, Giuseppe Colangelo +2 more | 2008-06-24 |
| 7160813 | Etch back process approach in dual source plasma reactors | Cindy W. Chen, Eddie Chiu, Mavis J. Chaboya | 2007-01-09 |
| 6955177 | Methods for post polysilicon etch photoresist and polymer removal with minimal gate oxide loss | Eddie Chiu, Cindy W. Chen, Wesley P. Graff | 2005-10-18 |
| 6855225 | Single-tube interlaced inductively coupling plasma source | David Chen, Vincent Decaux | 2005-02-15 |
| 6125788 | Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter | Graham W. Hills | 2000-10-03 |
| 5996218 | Method of forming an electrostatic chuck suitable for magnetic flux processing | Shamouil Shamouilian, John F. Cameron, Chandra Deshpandey | 1999-12-07 |
| 5895937 | Tapered dielectric etch in semiconductor devices | Yuen-Kui Wong, Kam S. Law, Haruhiro (Harry) Goto | 1999-04-20 |
| 5893757 | Tapered profile etching method | Yuen-Kui Wong, Kam S. Law | 1999-04-13 |
| 5843277 | Dry-etch of indium and tin oxides with C2H5I gas | Haruhiro Harry Goto, Yuen-Kui Wong, Kam S. Law | 1998-12-01 |
| 5744049 | Plasma reactor with enhanced plasma uniformity by gas addition, and method of using same | Graham W. Hills | 1998-04-28 |
| 5728608 | Tapered dielectric etch in semiconductor devices | Yuen-Kui Wong, Kam S. Law, Haruhiro (Harry) Goto | 1998-03-17 |
| 5685914 | Focus ring for semiconductor wafer processing in a plasma reactor | Graham W. Hills, Yoshiaki Tanase, Robert E. Ryan | 1997-11-11 |
| 5607602 | High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas | Yuen-Kui Wong, Kam S. Law, Haruhiro Harry Goto | 1997-03-04 |
| 5592358 | Electrostatic chuck for magnetic flux processing | Shamouil Shamouilian, John F. Cameron, Chandra Deshpandey | 1997-01-07 |
| 5589002 | Gas distribution plate for semiconductor wafer processing apparatus with means for inhibiting arcing | — | 1996-12-31 |
| 5528451 | Erosion resistant electrostatic chuck | — | 1996-06-18 |
| 5507874 | Method of cleaning of an electrostatic chuck in plasma reactors | Richard Muh | 1996-04-16 |
| 5410122 | Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers | Anand Gupta, Graham W. Hills, Joseph Lanucha | 1995-04-25 |