Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5622595 | Reducing particulate contamination during semiconductor device processing | Anand Gupta | 1997-04-22 |
| 5456796 | Control of particle generation within a reaction chamber | Anand Gupta, Yan Ye | 1995-10-10 |
| 5423918 | Method for reducing particulate contamination during plasma processing of semiconductor devices | Anand Gupta, Charles S. Rhoades, Yan Ye | 1995-06-13 |
| 5410122 | Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers | Yuh-Jia Su, Anand Gupta, Graham W. Hills | 1995-04-25 |