Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers

Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers

US Patent 5410122 · Granted Apr 25, 1995

Estimated economic value: $51,415,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Contextual scenario assessment2025
Determining geolocations of composite entities based on heterogeneous data sourc2025
Systems and methods for generating, analyzing, and storing data snippets2025
Systems and methods for coherent monitoring2025
Determining object geolocations based on heterogeneous data sources2024
Determining geolocations of composite entities based on heterogeneous data sourc2024
Systems and methods for generating, analyzing, and storing data snippets2024
Display screen or portion thereof with graphical user interface2023
Systems and methods for generating augmented reality content2023
Systems and methods for coherent monitoring2023
Graph analysis of geo-temporal information2023
Methods and systems for merging EGR with intake air2023