Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5753137 | Dry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising material | Yan Ye, Gerald Yin | 1998-05-19 |
| 5685916 | Dry cleaning of semiconductor processing chambers | Yan Ye, Gerald Yin | 1997-11-11 |
| 5676759 | Plasma dry cleaning of semiconductor processing chambers | Yan Ye, Gerald Yin | 1997-10-14 |
| 5545289 | Passivating, stripping and corrosion inhibition of semiconductor substrates | Jian-Sheng Chen, James S. Papanu, Steve S. Y. Mak, Carmel Ish-Shalom, Peter Hsieh +5 more | 1996-08-13 |
| 5494523 | Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances | Robert Steger, Anand Gupta | 1996-02-27 |
| 5486235 | Plasma dry cleaning of semiconductor processing chambers | Yan Ye, Gerald Yin | 1996-01-23 |
| 5423918 | Method for reducing particulate contamination during plasma processing of semiconductor devices | Anand Gupta, Yan Ye, Joseph Lanucha | 1995-06-13 |
| 5387556 | Etching aluminum and its alloys using HC1, C1-containing etchant and N.sub. 2 | Diana M. Xiaobing | 1995-02-07 |
| 5384009 | Plasma etching using xenon | Steven Mak, Brian Sy-Yuan Shieh | 1995-01-24 |
| 5221424 | Method for removal of photoresist over metal which also removes or inactivates corosion-forming materials remaining from previous metal etch | — | 1993-06-22 |