Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5817534 | RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers | Yan Ye, Hiroji Hanawa, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt +2 more | 1998-10-06 |
| 5384009 | Plasma etching using xenon | Brian Sy-Yuan Shieh, Charles S. Rhoades | 1995-01-24 |