Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6440866 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2002-08-27 |
| 6218312 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2001-04-17 |
| 6036876 | Dry-etching of indium and tin oxides | Jie Chen | 2000-03-14 |
| 6036877 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2000-03-14 |
| 5895937 | Tapered dielectric etch in semiconductor devices | Yuh-Jia Su, Kam S. Law, Haruhiro (Harry) Goto | 1999-04-20 |
| 5893757 | Tapered profile etching method | Yuh-Jia Su, Kam S. Law | 1999-04-13 |
| 5843277 | Dry-etch of indium and tin oxides with C2H5I gas | Haruhiro Harry Goto, Yuh-Jia Su, Kam S. Law | 1998-12-01 |
| 5728608 | Tapered dielectric etch in semiconductor devices | Yuh-Jia Su, Kam S. Law, Haruhiro (Harry) Goto | 1998-03-17 |
| 5607602 | High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas | Yuh-Jia Su, Kam S. Law, Haruhiro Harry Goto | 1997-03-04 |