Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6558507 | Plasma processing apparatus | Koji Teranishi, Satoshi Takaki | 2003-05-06 |
| 6435130 | Plasma CVD apparatus and plasma processing method | Satoshi Takaki, Yoshio Segi, Hiroyuki Katagiri, Hitoshi Murayama, Yasuyoshi Takai | 2002-08-20 |
| 6291029 | Plasma processing method | Satoshi Takaki, Nobuyuki Okamura | 2001-09-18 |
| 6152071 | High-frequency introducing means, plasma treatment apparatus, and plasma treatment method | Kazuyoshi Akiyama, Satoshi Takaki, Koji Teranishi | 2000-11-28 |
| 6145469 | Plasma processing apparatus and processing method | Koji Teranishi, Satoshi Takaki | 2000-11-14 |
| 6076481 | Plasma processing apparatus and plasma processing method | Satoshi Takaki | 2000-06-20 |
| 6065425 | Plasma process apparatus and plasma process method | Satoshi Takaki | 2000-05-23 |
| 5970907 | Plasma processing apparatus | Satoshi Takai, Nobuyuki Okamura | 1999-10-26 |
| 5846612 | Process for forming high-quality deposited film utilizing plasma CVD | Satoshi Takaki, Nobuyuki Okamura | 1998-12-08 |
| 5728278 | Plasma processing apparatus | Nobuyuki Okamura, Tadahiro Ohmi, Haruhiro Harry Goto, Tadashi Shibata | 1998-03-17 |
| 5607560 | Diamond crystal forming method | Keiji Hirabayashi | 1997-03-04 |
| 5540781 | Plasma CVD process using a very-high-frequency and plasma CVD apparatus | Nobuyuki Okamura, Satoshi Takaki | 1996-07-30 |
| 5534070 | Plasma CVD process using a very-high-frequency and plasma CVD apparatus | Nobuyuki Okamura, Satoshi Takaki | 1996-07-09 |
| 5510011 | Method for forming a functional deposited film by bias sputtering process at a relatively low substrate temperature | Nobuyuki Okamura | 1996-04-23 |
| 5316645 | Plasma processing apparatus | Nobuyuki Okamura, Tadahiro Ohmi, Haruhiro Harry Goto, Tadashi Shibata | 1994-05-31 |
| 5178905 | Process for the formation of a functional deposited film by hydrogen radical-assisted cvd method utilizing hydrogen gas plasma in sheet-like state | Masahiro Kanai | 1993-01-12 |