| 7550180 |
Plasma treatment method |
Toshiyasu Shirasuna, Tatsuyuki Aoike, Kazuyoshi Akiyama, Takashi Otsuka, Daisuke Tazawa +2 more |
2009-06-23 |
$329,000 |
| 7051671 |
Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article |
Makoto Aoki, Toshiyasu Shirasuna, Hiroaki Niino, Kazuyoshi Akiyama, Shinji Tsuchida +2 more |
2006-05-30 |
$221,000 |
| 6946167 |
Deposited film forming apparatus and deposited film forming method |
Kazuto Hosoi, Toshiyasu Shirasuna, Kazuhiko Takada, Ryuji Okamura, Kazuyoshi Akiyama |
2005-09-20 |
$104,000 |
| 6861373 |
Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode |
Makoto Aoki, Toshiyasu Shirasuna, Hiroaki Niino, Kazuyoshi Akiyama, Shinji Tsuchida +2 more |
2005-03-01 |
$208,000 |
| 6849123 |
Plasma processing method and method for manufacturing semiconductor device |
Hiroaki Niino, Toshiyasu Shirasuna, Makoto Aoki |
2005-02-01 |
$380,000 |
| 6761128 |
Plasma treatment apparatus |
Toshiyasu Shirasuna, Tatsuyuki Aoike, Kazuyoshi Akiyama, Takashi Otsuka, Daisuke Tazawa +2 more |
2004-07-13 |
$257,000 |
| 6702898 |
Deposited film forming apparatus |
Kazuto Hosoi, Toshiyasu Shirasuna, Kazuhiko Takada, Ryuji Okamura, Kazuyoshi Akiyama |
2004-03-09 |
$139,000 |
| 6696108 |
Vacuum processing method |
Toshiyasu Shirasuna, Hiroaki Niino, Makoto Aoki |
2004-02-24 |
$358,000 |
| 6649020 |
Plasma processing apparatus |
Ryuji Okamura, Tatsuyuki Aoike, Toshiyasu Shirasuna, Kazuhiko Takada, Kazuyoshi Akiyama |
2003-11-18 |
$147,000 |
| 6486045 |
Apparatus and method for forming deposited film |
Takashi Otsuka, Tatsuyuki Aoike, Toshiyasu Shirasuna, Kazuyoshi Akiyama, Daisuke Tazawa +1 more |
2002-11-26 |
$306,000 |
| 6443191 |
Vacuum processing methods |
Tatsuyuki Aoike, Toshiyasu Shirasuna, Kazuyoshi Akiyama, Takashi Ohtsuka, Daisuke Tazawa +2 more |
2002-09-03 |
$200,000 |
| 6435130 |
Plasma CVD apparatus and plasma processing method |
Satoshi Takaki, Yoshio Segi, Atsushi Yamagami, Hiroyuki Katagiri, Yasuyoshi Takai |
2002-08-20 |
$110,000 |
| 6413592 |
Apparatus for forming a deposited film by plasma chemical vapor deposition |
Ryuji Okamura, Toshiyasu Shirasuna, Kazuhiko Takada, Kazuyoshi Akiyama |
2002-07-02 |
$220,000 |
| 6350497 |
Plasma processing method |
Toshiyasu Shirasuna, Ryuji Okamura, Kazuyoshi Akiyama, Takashi Ohtsuka, Kazuto Hosoi |
2002-02-26 |
$230,000 |
| 6347601 |
Film forming apparatus |
Kazuto Hosoi, Toshiyasu Shirasuna, Kazuhiko Takada, Ryuji Okamura, Kazuyoshi Akiyama |
2002-02-19 |
$262,000 |
| 6336423 |
Apparatus for forming a deposited film by plasma chemical vapor deposition |
Ryuji Okamura, Toshiyasu Shirasuna, Kazuhiko Takada, Kazuyoshi Akiyama |
2002-01-08 |
$182,000 |
| 6321759 |
Method for cleaning a substrate |
Ryuji Okamura, Toshiyasu Shirasuna, Kazuhiko Takada, Kazuyoshi Akiyama, Kazuto Hosoi |
2001-11-27 |
$160,000 |
| 6300225 |
Plasma processing method |
Ryuji Okamura, Tatsuyuki Aoike, Toshiyasu Shirasuna, Kazuhiko Takada, Kazuyoshi Akiyama |
2001-10-09 |
$161,000 |
| 6250251 |
Vacuum processing apparatus and vacuum processing method |
Kazuyoshi Akiyama, Tatsuyuki Aoike, Toshiyasu Shirasuna, Takashi Otsuka, Daisuke Tazawa +1 more |
2001-06-26 |
$191,000 |
| 6165274 |
Plasma processing apparatus and method |
Kazuyoshi Akiyama, Tatsuyuki Aoike, Toshiyasu Shirasuna, Kazuhiko Takada, Ryuji Okamura |
2000-12-26 |
$161,000 |
| 6155201 |
Plasma processing apparatus and plasma processing method |
Toshiyasu Shirasuna, Ryuji Okamura, Kazuyoshi Akiyama, Takashi Ohtsuka, Kazuto Hosoi |
2000-12-05 |
$207,000 |
| 6148763 |
Deposited film forming apparatus |
Kazuyoshi Akiyama, Toshiyasu Shirasuna, Kazuhiko Takada, Ryuji Okamura |
2000-11-21 |
$180,000 |
| 5817181 |
Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus |
Ryuji Okamura, Kazuyoshi Akiyama, Koji Hitsuishi, Satoshi Kojima, Hirokazu Ohtoshi +1 more |
1998-10-06 |
$38,000 |
| 5766811 |
Method of manufacturing amorphous silicon electrophotographic photosensitive member |
Satoshi Kojima |
1998-06-16 |
$59,000 |
| 5631727 |
Image forming apparatus having discharging means using light source actuated prior to latent image formation |
Toshiyuki Ehara, Koji Yamazaki, Shigenori Ueda |
1997-05-20 |
$107,000 |
