Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma CVD apparatus and plasma processing method

Plasma CVD apparatus and plasma processing method

US Patent 6435130 · Granted Aug 20, 2002

Estimated economic value: $110,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Work vehicle with dust intrusion prevention mechanism2025
Work vehicle2025
Work vehicle2025
Conveyance apparatus for conveying mold2025
Work vehicle2025
Injection molding system with conveyor devices to insert or eject molds2025
Working machine2023
Image forming method using ultrasound and aberration correction method2017
Method for manufacturing an electromechanical transducer2015
Top gate thin film transistor and display apparatus including the same2014
Method for controlling threshold voltage of semiconductor element2013
Semiconductor device and display apparatus2013