Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10976682 | Method for controlling electrophotographic apparatus | Yukihiro Abe, Motoya Yamada, Hironori Owaki, Jun Ohira, Yuu Nishimura | 2021-04-13 |
| 9588447 | Electrophotographic photosensitive member, method for manufacturing the same, and electrophotographic apparatus | Yuu Nishimura | 2017-03-07 |
| 9091948 | Electrophotographic photosensitive member, method for manufacturing the same, and electrophotographic apparatus | Yuu Nishimura | 2015-07-28 |
| 7550180 | Plasma treatment method | Tatsuyuki Aoike, Kazuyoshi Akiyama, Hitoshi Murayama, Takashi Otsuka, Daisuke Tazawa +2 more | 2009-06-23 |
| 7051671 | Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article | Makoto Aoki, Hiroaki Niino, Kazuyoshi Akiyama, Hitoshi Murayama, Shinji Tsuchida +2 more | 2006-05-30 |
| 6946167 | Deposited film forming apparatus and deposited film forming method | Kazuto Hosoi, Kazuhiko Takada, Ryuji Okamura, Kazuyoshi Akiyama, Hitoshi Murayama | 2005-09-20 |
| 6861373 | Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode | Makoto Aoki, Hiroaki Niino, Kazuyoshi Akiyama, Hitoshi Murayama, Shinji Tsuchida +2 more | 2005-03-01 |
| 6849123 | Plasma processing method and method for manufacturing semiconductor device | Hiroaki Niino, Hitoshi Murayama, Makoto Aoki | 2005-02-01 |
| 6761128 | Plasma treatment apparatus | Tatsuyuki Aoike, Kazuyoshi Akiyama, Hitoshi Murayama, Takashi Otsuka, Daisuke Tazawa +2 more | 2004-07-13 |
| 6702898 | Deposited film forming apparatus | Kazuto Hosoi, Kazuhiko Takada, Ryuji Okamura, Kazuyoshi Akiyama, Hitoshi Murayama | 2004-03-09 |
| 6696108 | Vacuum processing method | Hitoshi Murayama, Hiroaki Niino, Makoto Aoki | 2004-02-24 |
| 6649020 | Plasma processing apparatus | Ryuji Okamura, Tatsuyuki Aoike, Kazuhiko Takada, Kazuyoshi Akiyama, Hitoshi Murayama | 2003-11-18 |
| 6486045 | Apparatus and method for forming deposited film | Takashi Otsuka, Tatsuyuki Aoike, Kazuyoshi Akiyama, Hitoshi Murayama, Daisuke Tazawa +1 more | 2002-11-26 |
| 6443191 | Vacuum processing methods | Hitoshi Murayama, Tatsuyuki Aoike, Kazuyoshi Akiyama, Takashi Ohtsuka, Daisuke Tazawa +2 more | 2002-09-03 |
| 6413592 | Apparatus for forming a deposited film by plasma chemical vapor deposition | Ryuji Okamura, Kazuhiko Takada, Kazuyoshi Akiyama, Hitoshi Murayama | 2002-07-02 |
| 6391394 | Method for manufacturing electrophotographic photosensitive member and jig used therein | Yoshio Segi, Hiroyuki Katagiri | 2002-05-21 |
| 6350497 | Plasma processing method | Hitoshi Murayama, Ryuji Okamura, Kazuyoshi Akiyama, Takashi Ohtsuka, Kazuto Hosoi | 2002-02-26 |
| 6347601 | Film forming apparatus | Kazuto Hosoi, Kazuhiko Takada, Ryuji Okamura, Kazuyoshi Akiyama, Hitoshi Murayama | 2002-02-19 |
| 6336423 | Apparatus for forming a deposited film by plasma chemical vapor deposition | Ryuji Okamura, Kazuhiko Takada, Kazuyoshi Akiyama, Hitoshi Murayama | 2002-01-08 |
| 6321759 | Method for cleaning a substrate | Ryuji Okamura, Kazuhiko Takada, Kazuyoshi Akiyama, Hitoshi Murayama, Kazuto Hosoi | 2001-11-27 |
| 6300225 | Plasma processing method | Ryuji Okamura, Tatsuyuki Aoike, Kazuhiko Takada, Kazuyoshi Akiyama, Hitoshi Murayama | 2001-10-09 |
| 6250251 | Vacuum processing apparatus and vacuum processing method | Kazuyoshi Akiyama, Tatsuyuki Aoike, Hitoshi Murayama, Takashi Otsuka, Daisuke Tazawa +1 more | 2001-06-26 |
| 6165274 | Plasma processing apparatus and method | Kazuyoshi Akiyama, Tatsuyuki Aoike, Kazuhiko Takada, Ryuji Okamura, Hitoshi Murayama | 2000-12-26 |
| 6155201 | Plasma processing apparatus and plasma processing method | Hitoshi Murayama, Ryuji Okamura, Kazuyoshi Akiyama, Takashi Ohtsuka, Kazuto Hosoi | 2000-12-05 |
| 6148763 | Deposited film forming apparatus | Kazuyoshi Akiyama, Kazuhiko Takada, Ryuji Okamura, Hitoshi Murayama | 2000-11-21 |