Issued Patents All Time
Showing 126–142 of 142 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7972968 | High density plasma gapfill deposition-etch-deposition process etchant | Young S. Lee, Ying Rui, Dmitry Lubomirsky, Daniel J. Hoffman, Jang-Gyoo Yang | 2011-07-05 |
| 7910491 | Gapfill improvement with low etch rate dielectric liners | Young Soo Kwon, Bi Jang, Young S. Lee, Mihaela Balseanu, Li-Qun Xia +1 more | 2011-03-22 |
| 7867921 | Reduction of etch-rate drift in HDP processes | Young S. Lee, Manoj Vellaikal, Jason Bloking, Jin-Ho Jeon, Hemant P. Mungekar | 2011-01-11 |
| 7745350 | Impurity control in HDP-CVD DEP/ETCH/DEP processes | Young S. Lee, Manoj Vellaikal, Jason Bloking, Jin-Ho Jeon, Hemant P. Mungekar | 2010-06-29 |
| 7678715 | Low wet etch rate silicon nitride film | Hemant P. Mungekar, Jing-Lung Wu, Young S. Lee | 2010-03-16 |
| 7628897 | Reactive ion etching for semiconductor device feature topography modification | Hemant P. Mungekar, Anjana M. Patel, Manoj Vellaikal, Bikram Kapoor | 2009-12-08 |
| 7629271 | High stress diamond like carbon film | Jing-Lung Wu, Robert Chen, Young S. Lee | 2009-12-08 |
| 7595088 | Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology | Bikram Kapoor, M. Ziaul Karim | 2009-09-29 |
| 7524750 | Integrated process modulation (IPM) a novel solution for gapfill with HDP-CVD | Srinivas D. Nemani, Young S. Lee, Ellie Yieh, Jason Bloking, Lung-Tien Han | 2009-04-28 |
| 7383702 | Method of forming a phosphorus doped optical core using a PECVD process | Hichem M'Saad, Sang-Hoon Ahn | 2008-06-10 |
| 7325419 | Method of forming a phosphorus doped optical core using a PECVD process | Hichem M'Saad, Sang-Hoon Ahn | 2008-02-05 |
| 7244658 | Low stress STI films and methods | Ellie Yieh, Lung-Tien Han, Lin Zhang | 2007-07-17 |
| 7205240 | HDP-CVD multistep gapfill process | M. Ziaul Karim, Bikram Kapoor, Dong Li, Katsunari Ozeki, Manoj Vellaikal +1 more | 2007-04-17 |
| 7080528 | Method of forming a phosphorus doped optical core using a PECVD process | Hichem M'Saad, Sang-Hoon Ahn | 2006-07-25 |
| 6890597 | HDP-CVD uniformity control | Padmanabhan Krishnaraj, Bruno Geoffrion, Michael S. Cox, Lin Zhang, Bikram Kapoor +1 more | 2005-05-10 |
| 6808748 | Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology | Bikram Kapoor, M. Ziaul Karim | 2004-10-26 |
| 6667248 | Low-bias-deposited high-density-plasma chemical-vapor-deposition silicate glass layers | Hichem M'Saad, Chad Peterson, Zhuang Li, Farhad Moghadam | 2003-12-23 |