Issued Patents All Time
Showing 101–125 of 142 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9093371 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-07-28 |
| 9064816 | Dry-etch for selective oxidation removal | Sang Hyuk Kim, Dongqing Yang, Young S. Lee, Weon Young Jung, Sang Jin Kim +2 more | 2015-06-23 |
| 9064815 | Methods for etch of metal and metal-oxide films | Jingchun Zhang, Nitin K. Ingle | 2015-06-23 |
| 9040422 | Selective titanium nitride removal | Xikun Wang, Nitin K. Ingle, Dmitry Lubomirsky | 2015-05-26 |
| 9034770 | Differential silicon oxide etch | Seung Ho Park, Yunyu Wang, Jingchun Zhang, Nitin K. Ingle | 2015-05-19 |
| 9023732 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-05-05 |
| 9023734 | Radical-component oxide etch | Zhijun Chen, Jingchun Zhang, Ching-Mei Hsu, Seung Ho Park, Nitin K. Ingle | 2015-05-05 |
| 8999856 | Methods for etch of sin films | Jingchun Zhang, Nitin K. Ingle | 2015-04-07 |
| 8980763 | Dry-etch for selective tungsten removal | Xikun Wang, Ching-Mei Hsu, Nitin K. Ingle, Zihui Li | 2015-03-17 |
| 8969212 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Soonam Park, Saurabh Garg +2 more | 2015-03-03 |
| 8956980 | Selective etch of silicon nitride | Zhijun Chen, Zihui Li, Nitin K. Ingle, Shankar Venkataraman | 2015-02-17 |
| 8951429 | Tungsten oxide processing | Jie Liu, Xikun Wang, Seung Ho Park, Mikhail Korolik, Nitin K. Ingle | 2015-02-10 |
| 8921234 | Selective titanium nitride etching | Jie Liu, Jingchun Zhang, Nitin K. Ingle, Seung Ho Park, Zhijun Chen +1 more | 2014-12-30 |
| 8808563 | Selective etch of silicon by way of metastable hydrogen termination | Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-08-19 |
| 8801952 | Conformal oxide dry etch | Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-08-12 |
| 8771536 | Dry-etch for silicon-and-carbon-containing films | Jingchun Zhang, Nitin K. Ingle, Yunyu Wang, Young S. Lee | 2014-07-08 |
| 8771539 | Remotely-excited fluorine and water vapor etch | Jingchun Zhang, Nitin K. Ingle | 2014-07-08 |
| 8765574 | Dry etch process | Jingchun Zhang, Nitin K. Ingle | 2014-07-01 |
| 8679982 | Selective suppression of dry-etch rate of materials containing both silicon and oxygen | Yunyu Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-03-25 |
| 8679983 | Selective suppression of dry-etch rate of materials containing both silicon and nitrogen | Yunyu Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-03-25 |
| 8642481 | Dry-etch for silicon-and-nitrogen-containing films | Yunyu Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-02-04 |
| 8541312 | Selective suppression of dry-etch rate of materials containing both silicon and nitrogen | Yunyu Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2013-09-24 |
| 8497211 | Integrated process modulation for PSG gapfill | Young S. Lee, Lan Chia Chan, Shankar Venkataraman | 2013-07-30 |
| 8450191 | Polysilicon films by HDP-CVD | Xiaolin Chen, Young S. Lee | 2013-05-28 |
| 8138364 | Transparent conducting oxide thin films and related devices | Tobin J. Marks, Jun Ni, Yu-Chi Yang, Andrew Metz, Shu Jin +1 more | 2012-03-20 |