Issued Patents All Time
Showing 51–75 of 142 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9754800 | Selective etch for silicon films | Jingchun Zhang, Nitin K. Ingle | 2017-09-05 |
| 9704723 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2017-07-11 |
| 9659792 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2017-05-23 |
| 9659791 | Metal removal with reduced surface roughness | Xikun Wang, David Cui, Nitin K. Ingle | 2017-05-23 |
| 9653310 | Methods for selective etching of a silicon material | Zihui Li, Xing-Fu Zhong, Nitin K. Ingle | 2017-05-16 |
| 9613822 | Oxide etch selectivity enhancement | Zhijun Chen, Nitin K. Ingle | 2017-04-04 |
| 9607856 | Selective titanium nitride removal | Xikun Wang, Nitin K. Ingle, Dmitry Lubomirsky | 2017-03-28 |
| 9576788 | Cleaning high aspect ratio vias | Jie Liu, Seung Ho Park, Zhenjiang Cui, Nitin K. Ingle | 2017-02-21 |
| 9576815 | Gas-phase silicon nitride selective etch | Jingjing Xu, Fei Wang, Nitin K. Ingle, Robert Jan Visser | 2017-02-21 |
| 9576809 | Etch suppression with germanium | Mikhail Korolik, Nitin K. Ingle, Jingchun Zhang, Jie Liu | 2017-02-21 |
| 9564341 | Gas-phase silicon oxide selective etch | Jingjing Xu, Nitin K. Ingle | 2017-02-07 |
| 9553102 | Tungsten separation | Xikun Wang, Jie Liu, Nitin K. Ingle | 2017-01-24 |
| 9520303 | Aluminum selective etch | Xikun Wang, Nitin K. Ingle | 2016-12-13 |
| 9502258 | Anisotropic gap etch | Jun Xue, Ching-Mei Hsu, Zihui Li, Ludovic Godet, Nitin K. Ingle | 2016-11-22 |
| 9478434 | Chlorine-based hardmask removal | Xikun Wang, Mandar B. Pandit, Zhenjiang Cui, Mikhail Korolik, Nitin K. Ingle +1 more | 2016-10-25 |
| 9478432 | Silicon oxide selective removal | Zhijun Chen, Nitin K. Ingle | 2016-10-25 |
| 9449850 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2016-09-20 |
| 9449846 | Vertical gate separation | Jie Liu, Vinod R. Purayath, Xikun Wang, Nitin K. Ingle | 2016-09-20 |
| 9449845 | Selective titanium nitride etching | Jie Liu, Jingchun Zhang, Nitin K. Ingle, Seung Ho Park, Zhijun Chen +1 more | 2016-09-20 |
| 9437451 | Radical-component oxide etch | Zhijun Chen, Jingchun Zhang, Ching-Mei Hsu, Seung Ho Park, Nitin K. Ingle | 2016-09-06 |
| 9418858 | Selective etch of silicon by way of metastable hydrogen termination | Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2016-08-16 |
| 9412608 | Dry-etch for selective tungsten removal | Xikun Wang, Ching-Mei Hsu, Nitin K. Ingle, Zihui Li | 2016-08-09 |
| 9406523 | Highly selective doped oxide removal method | Zhijun Chen, Zihui Li, Nitin K. Ingle, Shankar Venkataraman | 2016-08-02 |
| 9390937 | Silicon-carbon-nitride selective etch | Zhijun Chen, Jingchun Zhang, Nitin K. Ingle | 2016-07-12 |
| 9384997 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Soonam Park, Saurabh Garg +2 more | 2016-07-05 |