Issued Patents All Time
Showing 76–100 of 142 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9378969 | Low temperature gas-phase carbon removal | Ching-Mei Hsu, Nitin K. Ingle, Hiroshi Hamana | 2016-06-28 |
| 9373522 | Titanium nitride removal | Xikun Wang, Mandar B. Pandit, Nitin K. Ingle | 2016-06-21 |
| 9368364 | Silicon etch process with tunable selectivity to SiO2 and other materials | Seung Ho Park | 2016-06-14 |
| 9355862 | Fluorine-based hardmask removal | Mandar B. Pandit, Xikun Wang, Zhenjiang Cui, Mikhail Korolik, Nitin K. Ingle | 2016-05-31 |
| 9355856 | V trench dry etch | Xikun Wang, Nitin K. Ingle | 2016-05-31 |
| 9355863 | Non-local plasma oxide etch | Zhijun Chen, Seung Ho Park, Mikhail Korolik, Nitin K. Ingle | 2016-05-31 |
| 9349605 | Oxide etch selectivity systems and methods | Lin Xu, Zhijun Chen, Son T. Nguyen | 2016-05-24 |
| 9343327 | Methods for etch of sin films | Jingchun Zhang, Nitin K. Ingle | 2016-05-17 |
| 9343272 | Self-aligned process | Mandar B. Pandit, Nitin K. Ingle | 2016-05-17 |
| 9324576 | Selective etch for silicon films | Jingchun Zhang, Nitin K. Ingle | 2016-04-26 |
| 9309598 | Oxide and metal removal | Xikun Wang, Jie Liu, Nitin K. Ingle, Jeffrey W. Anthis, Benjamin Schmiege | 2016-04-12 |
| 9299575 | Gas-phase tungsten etch | Seung Ho Park, Xikun Wang, Jie Liu, Sang Jin Kim | 2016-03-29 |
| 9299583 | Aluminum oxide selective etch | Xikun Wang, Nitin K. Ingle | 2016-03-29 |
| 9287134 | Titanium oxide etch | Xikun Wang, Lin Xu, Nitin K. Ingle | 2016-03-15 |
| 9275834 | Selective titanium nitride etch | Seung Ho Park, Mikhail Korolik, Nitin K. Ingle | 2016-03-01 |
| 9263278 | Dopant etch selectivity control | Vinod R. Purayath, Nitin K. Ingle | 2016-02-16 |
| 9236265 | Silicon germanium processing | Mikhail Korolik, Nitin K. Ingle, Jingjing Xu | 2016-01-12 |
| 9236266 | Dry-etch for silicon-and-carbon-containing films | Jingchun Zhang, Nitin K. Ingle, Yunyu Wang, Young S. Lee | 2016-01-12 |
| 9209012 | Selective etch of silicon nitride | Zhijun Chen, Zihui Li, Nitin K. Ingle, Shankar Venkataraman | 2015-12-08 |
| 9202708 | Doped silicon oxide etch | Zhijun Chen, Sang Jin Kim, Nitin K. Ingle | 2015-12-01 |
| 9190293 | Even tungsten etch for high aspect ratio trenches | Xikun Wang, Jie Liu, Nitin K. Ingle | 2015-11-17 |
| 9184055 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-11-10 |
| 9153442 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2015-10-06 |
| 9111877 | Non-local plasma oxide etch | Zhijun Chen, Seung Ho Park, Mikhail Korolik, Nitin K. Ingle | 2015-08-18 |
| 9093390 | Conformal oxide dry etch | Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2015-07-28 |